Investigation of the amorphous to microcrystalline phase transition of thin film prepared by electron cyclotron resonance chemical vapor deposition method

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.10.008 ◽

2013 ◽

Vol 231 ◽

pp. 604-607 ◽

Author(s):

Teng-Hsiang Chang ◽

Jenq-Yang Chang ◽

Yen-Ho Chu ◽

Chien-Chieh Lee ◽

I-Chen Chen ◽

...

Keyword(s):

Thin Film ◽

Phase Transition ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Chemical Vapor Deposition Method ◽

Deposition Method

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Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.22.l210 ◽

1983 ◽

Vol 22 (Part 2, No. 4) ◽

pp. L210-L212 ◽

Author(s):

Seitaro Matsuo ◽

Mikiho Kiuchi

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma

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Hydrogenated Silicon Thin Film and Solar Cell Prepared by Electron Cyclotron Resonance Chemical Vapor Deposition Method

ECS Transactions ◽

10.1149/1.3567721 ◽

2019 ◽

Vol 34 (1) ◽

pp. 1103-1108 ◽

Author(s):

Chien-Chieh Lee ◽

Jenq-Yang Chang ◽

Yen-Ho Chu ◽

Chung-Min Lien ◽

I-Chen Chen ◽

...

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Silicon Thin Film ◽

Hydrogenated Silicon

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Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.021 ◽

2006 ◽

Vol 506-507 ◽

pp. 184-187 ◽

Author(s):

Isao Sakaguchi ◽

Haruki Ryoken ◽

Shunichi Hishita ◽

Hajime Haneda

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Zno Thin Film ◽

Resonance Plasma

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Light element distribution in ZnO thin film deposited by electron cyclotron resonance assisted chemical vapor deposition

Applied Surface Science ◽

10.1016/s0169-4332(02)00784-5 ◽

2003 ◽

Vol 203-204 ◽

pp. 652-655 ◽

Author(s):

Isao Sakaguchi

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Light Element ◽

Chemical Vapor ◽

Element Distribution ◽

Electron Cyclotron ◽

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Very‐low‐pressure deposition by electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.346082 ◽

1990 ◽

Vol 67 (10) ◽

pp. 6281-6285 ◽

Author(s):

Koun Shirai ◽

Shun‐ichi Gonda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Evolution Of Structure

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c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Film Substrate ◽

Resonance Plasma

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Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582391 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1595-1598 ◽

Author(s):

Hyeongtag Jeon ◽

June-Woo Lee ◽

Young-Do Kim ◽

Deok-Soo Kim ◽

Kyoung-Soo Yi

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Atomic Layer ◽

Chemical Vapor Deposition Method ◽

Deposition Method

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In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Author(s):

Y. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

In Situ Investigation ◽

Resonance Plasma

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