Predicting the kinetics of the dissociative adsorption of homonuclear molecules on metal surfaces in gas phase and solution

2004 ◽  
Vol 554 (2-3) ◽  
pp. 159-169 ◽  
Author(s):  
Ernst D. German ◽  
Alexander M. Kuznetsov ◽  
Moshe Sheintuch
Keyword(s):  
Gas Phase ◽  
Metal Surfaces ◽  
Dissociative Adsorption ◽  
Kinetics Of

Detailed Kinetics Modeling of Indium Phosphide Films in Mocvd Reactors

1997 ◽  
Vol 485 ◽  
Author(s):  
Maurizio Masi ◽  
Carlo Cavallotti ◽  
Guido Radaelli ◽  
S. Carrà
Keyword(s):  
Boundary Layer ◽  
Indium Phosphide ◽  
Gas Phase ◽  
Dissociative Adsorption ◽  
Boundary Layer Theory ◽  
Chemical Mechanism ◽  
Deposition Kinetics ◽  
Detailed Kinetics ◽  
Kinetics Of ◽  
Dual Site

AbstractThe deposition kinetics of InP in MOCVD reactors is presented. The proposed chemical mechanism involves both gas phase and surface reactions. The fundamental hypothesis adopted in deriving the mechanism was a dual site dissociative adsorption of the precursors on the growing surface. In any case, all the rate constants either were taken from the literature or estimated through thermochemical methods. In addition, the deposition reactor was simulated by means of a monodimensional model that accounts for the main reactor features through the boundary layer theory.

Diffusion model for deposition of epitaxial GaAs layers prepared by the MOCVD method

1991 ◽  
Vol 56 (10) ◽  
pp. 2020-2029
Author(s):  
Jindřich Leitner ◽  
Petr Voňka ◽  
Josef Stejskal ◽  
Přemysl Klíma ◽  
Rudolf Hladina
Keyword(s):  
Experimental Data ◽  
Growth Rate ◽  
Kinetic Model ◽  
Gas Phase ◽  
Substrate Surface ◽  
Deposition Process ◽  
Hydrogen Atmosphere ◽  
Epitaxial Gaas ◽  
Kinetics Of ◽  
Good Agreement

The authors proposed and treated quantitatively a kinetic model for deposition of epitaxial GaAs layers prepared by reaction of trimethylgallium with arsine in hydrogen atmosphere. The transport of gallium to the surface of the substrate is considered as the controlling process. The influence of the rate of chemical reactions in the gas phase and on the substrate surface on the kinetics of the deposition process is neglected. The calculated dependence of the growth rate of the layers on the conditions of the deposition is in a good agreement with experimental data in the temperature range from 600 to 800°C.

Gas-Phase Anionic Metal Clusters are Model Systems for Surface Oxidation: Kinetics of the Reactions of Mn– with O2 (M = V, Cr, Co, Ni; n = 1–15)

2021 ◽  
Vol 125 (10) ◽  
pp. 2069-2076
Author(s):  
Brendan C. Sweeny ◽  
David C. McDonald ◽  
Nicholas S. Shuman ◽  
Albert A. Viggiano ◽  
Juergen Troe ◽  
...  
Keyword(s):  
Gas Phase ◽  
Oxidation Kinetics ◽  
Metal Clusters ◽  
Surface Oxidation ◽  
Model Systems ◽  
Kinetics Of

Theoretical study of the mechanisms for the homogenous gas-phase elimination kinetics of some 2-hydroxynitroalkanes

2006 ◽  
Vol 19 (12) ◽  
pp. 836-840 ◽  
Author(s):  
Rafael Añez ◽  
Rodolfo Izquierdo ◽  
Alba Vidal ◽  
Tania Cordova ◽  
Aníbal Sierraalta ◽  
...  
Keyword(s):  
Gas Phase ◽  
Theoretical Study ◽  
Elimination Kinetics ◽  
Kinetics Of ◽  
Phase Elimination

Gas phase interaction with catalytic oxidation reactions

1972 ◽  
Vol 326 (1565) ◽  
pp. 215-227 ◽  
Keyword(s):  
Carbon Dioxide ◽  
Maleic Anhydride ◽  
Catalytic Oxidation ◽  
Gas Phase ◽  
Major Part ◽  
Oxidation Reactions ◽  
Mixed Gas ◽  
Kinetics Of ◽  
Oxidation Of Benzene ◽  
Homogeneous Decomposition

Studies of the catalytic oxidation of benzene to maleic anhydride and carbon dioxide over vanadia/molybdena catalysts show that the major part of the reaction involves interacting gas and gas-solid processes. The results are consistent with a mechanism in which a benzeneoxygen adduct is formed catalytically, desorbs and then reacts to give maleic anhydride entirely in the gas phase. On the basis of this proposed mechanism, the kinetics of individual reactions have been investigated in some depth. The over-oxidation of maleic anhydride has been found to be not significant under the conditions of reaction. The kinetic relationships governing the homogeneous decomposition of the adduct and the oxidation of the adduct to maleic anhydride and to carbon dioxide have been established. The results show that essentially all of the anhydride originates from mixed gas-solid/gas reaction while substantial amounts of carbon dioxide are produced entirely catalytically.

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