scholarly journals Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method

2004 ◽  
Vol 459 (1-2) ◽  
pp. 203-207 ◽  
Author(s):  
F.L Martı́nez ◽  
R Ruiz-Merino ◽  
A del Prado ◽  
E San Andrés ◽  
I Mártil ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Hydrogen Content ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Plasma Method ◽  
Bonding Structure ◽  
Resonance Plasma

scholarly journals Deposition of low temperature Si-based insulators by the electron cyclotron resonance plasma method

1998 ◽  
Vol 317 (1-2) ◽  
pp. 116-119 ◽  
Author(s):  
S Garcia ◽  
J.M Martin ◽  
I Martil ◽  
M Fernandez ◽  
G Gonzalez-Diaz
Keyword(s):  
Low Temperature ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Plasma Method ◽  
Resonance Plasma
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