Dielectric Permittivity of Amorphous and Hexagonal Electron Cyclotron Resonance Plasma Deposited Ta[sub 2]O[sub 5] Thin Films

Electrochemical and Solid-State Letters ◽

10.1149/1.1390814 ◽

1999 ◽

Vol 2 (6) ◽

pp. 291 ◽

Author(s):

C. Chaneliere

Keyword(s):

Dielectric Permittivity ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Author(s):

OLEG A. POPOV

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153464 ◽

2015 ◽

Author(s):

L.C. Hu ◽

Y.W. Lin ◽

C.J. Wang ◽

T. C. Wei ◽

C.R. Yang ◽

...

Keyword(s):

Magnetic Field ◽

Plasma Diagnostics ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Magnetic Field Effects ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Resonance Magnetic Field

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Optical Properties of c-Axis Oriented Ba2NaNb5O15 Thin Films Formed by Electron Cyclotron Resonance Plasma Sputtering

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.105.687 ◽

1997 ◽

Vol 105 (1224) ◽

pp. 687-689

Author(s):

Akira WATAZU ◽

Hiroshi MASUMOTO ◽

Yoichiro MASUDA ◽

Toshio HIRAI

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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Preparation of ZnF2 and ZnF2–BaF2 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00716-6 ◽

2000 ◽

Vol 358 (1-2) ◽

pp. 99-103 ◽

Author(s):

Masanori Shojiya ◽

Yoji Kawamoto ◽

Akio Konishi ◽

Hajimu Wakabayashi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Passivation of GaAs(110) with Ga2O3 thin films deposited by electron cyclotron resonance plasma reactive molecular beam epitaxy

Journal of Applied Physics ◽

10.1063/1.1497455 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2330-2334 ◽

Author(s):

D. Kim ◽

G. Chen ◽

X. Y. Mei ◽

H. E. Ruda

Keyword(s):

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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$\bf TiO_{2}$ Thin Films Formed by Electron Cyclotron Resonance Plasma Oxidation at High Temperature and Their Application to Capacitor Dielectrics

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l1248 ◽

1994 ◽

Vol 33 (Part 2, No. 9A) ◽

pp. L1248-L1250 ◽

Author(s):

Yoshio Abe ◽

Takuya Fukuda

Keyword(s):

High Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Oxidation ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Ion beam-assisted planarization of chemically vapor deposited diamond thin films using electron cyclotron resonance plasma

Journal of Electronic Materials ◽

10.1007/s11664-997-0086-8 ◽

1997 ◽

Vol 26 (11) ◽

pp. 1365-1369 ◽

Author(s):

Dong-Gu Lee ◽

Donald R. Gilbert ◽

Rajiv K. Singh

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Beam ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Diamond Thin Films ◽

Chemically Vapor Deposited ◽

Resonance Plasma

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Growth and bonding structure of hard hydrogenated amorphous carbon thin films deposited from an electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.1423786 ◽

2002 ◽

Vol 91 (2) ◽

pp. 867-873 ◽

Author(s):

O. Durand-Drouhin ◽

M. Lejeune ◽

M. Benlahsen

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous Carbon ◽

Bonding Structure ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Preparation of α-Al2O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2899569 ◽

2008 ◽

Vol 26 (3) ◽

pp. 380-384 ◽

Author(s):

D. Yu ◽

Y. F. Lu ◽

N. Xu ◽

J. Sun ◽

Z. F. Ying ◽

...

Keyword(s):

Pulsed Laser Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pulsed Laser ◽

Electron Cyclotron ◽

Laser Deposition ◽

Electron Cyclotron Resonance Plasma ◽

Α Al2o3 ◽

Resonance Plasma

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