Growth and bonding structure of hard hydrogenated amorphous carbon thin films deposited from an electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.1423786 ◽

2002 ◽

Vol 91 (2) ◽

pp. 867-873 ◽

Author(s):

O. Durand-Drouhin ◽

M. Lejeune ◽

M. Benlahsen

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous Carbon ◽

Bonding Structure ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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The subimplantation model for hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma

Materials Science in Semiconductor Processing ◽

10.1016/s1369-8001(00)00097-4 ◽

2001 ◽

Vol 4 (1-3) ◽

pp. 213-215

Author(s):

O. Durand-Drouhin ◽

M. Lejeune ◽

R. Bouzerar ◽

M. Benlahsen

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Dissociative Excitation of C2H2 in the Electron Cyclotron Resonance Plasma of Ar: Production of CH(A2Δ) Radicals and Formation of Hydrogenated Amorphous Carbon Films

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-012-9355-2 ◽

2012 ◽

Vol 32 (2) ◽

pp. 231-248 ◽

Author(s):

Haruhiko Ito ◽

Katsuaki Koshimura ◽

Saori Onitsuka ◽

Kohtaro Okada ◽

Tsuneo Suzuki ◽

...

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Dissociative Excitation ◽

Electron Cyclotron Resonance Plasma ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effect of the hydrogen on the intrinsic stress in hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.122726 ◽

1998 ◽

Vol 73 (22) ◽

pp. 3226-3228 ◽

Author(s):

B. Racine ◽

M. Benlahsen ◽

K. Zellama ◽

P. Goudeau ◽

M. Zarrabian ◽

...

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Intrinsic Stress ◽

Electron Cyclotron Resonance Plasma ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method

Thin Solid Films ◽

10.1016/j.tsf.2003.12.084 ◽

2004 ◽

Vol 459 (1-2) ◽

pp. 203-207 ◽

Author(s):

F.L Martı́nez ◽

R Ruiz-Merino ◽

A del Prado ◽

E San Andrés ◽

I Mártil ◽

...

Keyword(s):

Silicon Nitride ◽

Hydrogen Content ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Bonding Structure ◽

Resonance Plasma

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Structural and electronic properties of electron cyclotron resonance plasma deposited hydrogenated amorphous carbon and carbon nitride films

Journal of Applied Physics ◽

10.1063/1.1454226 ◽

2002 ◽

Vol 91 (7) ◽

pp. 4154-4162 ◽

Author(s):

C. Godet ◽

N. M. J. Conway ◽

J. E. Bourée ◽

K. Bouamra ◽

A. Grosman ◽

...

Keyword(s):

Electronic Properties ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Structural And Electronic Properties ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Dielectric Permittivity of Amorphous and Hexagonal Electron Cyclotron Resonance Plasma Deposited Ta[sub 2]O[sub 5] Thin Films

Electrochemical and Solid-State Letters ◽

10.1149/1.1390814 ◽

1999 ◽

Vol 2 (6) ◽

pp. 291 ◽

Author(s):

C. Chaneliere

Keyword(s):

Dielectric Permittivity ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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On the microstructural, optical and mechanical properties of hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00288-5 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 752-755 ◽

Author(s):

O. Durand-Drouhin ◽

A. Zeinert ◽

M. Benlahsen ◽

K. Zellama ◽

R. Kré ◽

...

Keyword(s):

Mechanical Properties ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Optical And Mechanical Properties ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films

Physics of Thin Films - Plasma Sources for Thin Film Deposition and Etching ◽

10.1016/b978-0-08-092513-4.50007-6 ◽

1994 ◽

pp. 121-233 ◽

Author(s):

OLEG A. POPOV

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sources ◽

Resonance Plasma

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Plasma diagnostics of resonance magnetic field effects on a-Si:H thin films deposition using electron cyclotron resonance plasma

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153464 ◽

2015 ◽

Author(s):

L.C. Hu ◽

Y.W. Lin ◽

C.J. Wang ◽

T. C. Wei ◽

C.R. Yang ◽

...

Keyword(s):

Magnetic Field ◽

Plasma Diagnostics ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Magnetic Field Effects ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Resonance Magnetic Field

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Optical Properties of c-Axis Oriented Ba2NaNb5O15 Thin Films Formed by Electron Cyclotron Resonance Plasma Sputtering

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.105.687 ◽

1997 ◽

Vol 105 (1224) ◽

pp. 687-689

Author(s):

Akira WATAZU ◽

Hiroshi MASUMOTO ◽

Yoichiro MASUDA ◽

Toshio HIRAI

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Sputtering ◽

Resonance Plasma

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