Effect of high-frequency on etching of SiCOH films in CHF3 dual-frequency capacitively coupled plasmas

Thin Solid Films ◽

10.1016/j.tsf.2009.10.121 ◽

2010 ◽

Vol 518 (12) ◽

pp. 3223-3227 ◽

Author(s):

Chao Ye ◽

Yijun Xu ◽

Xiaojiang Huang ◽

Zhaoyuan Ning

Keyword(s):

High Frequency ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas

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Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4906819 ◽

2015 ◽

Vol 33 (2) ◽

pp. 021310 ◽

Author(s):

Yu-Ru Zhang ◽

Stefan Tinck ◽

Peter De Schepper ◽

You-Nian Wang ◽

Annemie Bogaerts

Keyword(s):

Experimental Investigation ◽

Single Frequency ◽

Dual Frequency ◽

Capacitively Coupled ◽

Frequency Regime ◽

Coupled Plasmas

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Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas

Journal of Applied Physics ◽

10.1063/1.3296349 ◽

2010 ◽

Vol 107 (5) ◽

pp. 053302 ◽

Author(s):

Kallol Bera ◽

Shahid Rauf ◽

Jason Kenney ◽

Leonid Dorf ◽

Ken Collins

Keyword(s):

Magnetic Field ◽

High Frequency ◽

Inhomogeneous Magnetic Field ◽

Very High Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

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Observation of the standing wave effect in large-area, very-high-frequency capacitively coupled plasmas by using a fiber Bragg grating sensor

Journal of Applied Physics ◽

10.1063/1.5024835 ◽

2018 ◽

Vol 123 (22) ◽

pp. 223304 ◽

Author(s):

Dao-Man Han ◽

Yong-Xin Liu ◽

Fei Gao ◽

Xiang-Yu Wang ◽

Ang Li ◽

...

Keyword(s):

Fiber Bragg Grating ◽

Standing Wave ◽

High Frequency ◽

Very High Frequency ◽

Wave Effect ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

Bragg Grating Sensor ◽

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Simulations of electromagnetic effects in large-area high-frequency capacitively coupled plasmas with symmetric electrodes: Different axial plasma density profiles

Physics of Plasmas ◽

10.1063/1.5129492 ◽

2020 ◽

Vol 27 (2) ◽

pp. 023502

Author(s):

Jian-Kai Liu ◽

Yu-Ru Zhang ◽

Kai Zhao ◽

De-Qi Wen ◽

You-Nian Wang

Keyword(s):

Plasma Density ◽

High Frequency ◽

Density Profiles ◽

Capacitively Coupled ◽

Electromagnetic Effects ◽

Coupled Plasmas

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Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: II. Effects of Nonuniform Bulk Plasma Density and Charging at Dielectric Surface

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.036001 ◽

2011 ◽

Vol 50 (3R) ◽

pp. 036001 ◽

Author(s):

Kazuki Denpoh ◽

Tatsuru Shirafuji

Keyword(s):

Finite Element ◽

Finite Element Model ◽

Radio Frequency ◽

Plasma Density ◽

Element Model ◽

Dielectric Surface ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

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Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4915248 ◽

2015 ◽

Vol 33 (3) ◽

pp. 031302 ◽

Author(s):

Yiting Zhang ◽

Mark J. Kushner ◽

Saravanapriyan Sriraman ◽

Alexei Marakhtanov ◽

John Holland ◽

...

Keyword(s):

Angular Distributions ◽

Dual Frequency ◽

Capacitively Coupled ◽

Energy And Angular Distributions ◽

Coupled Plasmas

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Phase modulation in pulsed dual-frequency capacitively coupled plasmas

Journal of Applied Physics ◽

10.1063/1.4884225 ◽

2014 ◽

Vol 115 (23) ◽

pp. 233303 ◽

Author(s):

De-Qi Wen ◽

Quan-Zhi Zhang ◽

Wei Jiang ◽

Yuan-Hong Song ◽

Annemie Bogaerts ◽

...

Keyword(s):

Phase Modulation ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas

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Infinite Etch Selectivity during Etching of SiON with an Extreme Ultraviolet Resist Pattern in Dual-Frequency Capacitively Coupled Plasmas

Journal of The Electrochemical Society ◽

10.1149/1.3251010 ◽

2010 ◽

Vol 157 (1) ◽

pp. D21 ◽

Author(s):

B. S. Kwon ◽

J. S. Kim ◽

N.-E. Lee ◽

S. K. Lee

Keyword(s):

Extreme Ultraviolet ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas

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The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas

Plasma Sources Science and Technology ◽

10.1088/1361-6595/aa7c88 ◽

2017 ◽

Vol 26 (8) ◽

pp. 085006 ◽

Author(s):

M Daksha ◽

A Derzsi ◽

S Wilczek ◽

J Trieschmann ◽

T Mussenbrock ◽

...

Keyword(s):

Electron Emission ◽

Secondary Electron ◽

Heavy Particle ◽

Secondary Electron Emission ◽

Dual Frequency ◽

Power Absorption ◽

Capacitively Coupled ◽

Coupled Plasmas

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Modification of Semianalytical Finite Element Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas: II. Effects of Nonuniform Bulk Plasma Density and Charging at Dielectric Surface

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.036001 ◽

2011 ◽

Vol 50 ◽

pp. 036001 ◽

Author(s):

Kazuki Denpoh ◽

Tatsuru Shirafuji

Keyword(s):

Finite Element ◽

Finite Element Model ◽

Radio Frequency ◽

Plasma Density ◽

Element Model ◽

Dielectric Surface ◽

Dual Frequency ◽

Capacitively Coupled ◽

Coupled Plasmas ◽

Download Full-text