Preparation and characterization of Nickel Oxide thin films by direct current reactive magnetron sputtering at different substrate temperatures

2014 ◽  
Vol 10 (5) ◽  
pp. 887-892 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Chang Woo Byun ◽  
Seung Ki Joo ◽  
A. Sivasankar Reddy ◽  
P. Sreedhara Reddy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Nickel Oxide ◽  
Direct Current ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Substrate Temperatures ◽  
Nickel Oxide Thin Films

Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

2010 ◽  
Vol 8 (S1) ◽  
pp. 73-77 ◽  
Author(s):  
Stefan Jakobs Stefan Jakobs ◽  
Marc Lappschies Marc Lappschies ◽  
Uwe Schallenberg Uwe Schallenberg ◽  
Olaf Stenzel Olaf Stenzel ◽  
Steffen Wilbrandt Steffen Wilbrandt
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Metal Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films
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