Effects of duty cycle and oxygen flow rate on the formation and properties of vanadium oxide films deposited by pulsed reactive sputtering

Vacuum ◽  
2014 ◽  
Vol 104 ◽  
pp. 97-104 ◽  
Author(s):  
Xiang Dong ◽  
Zhiming Wu ◽  
Xiangdong Xu ◽  
Tao Wang ◽  
Yadong Jiang
Keyword(s):  
Vanadium Oxide ◽  
Flow Rate ◽  
Duty Cycle ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Vanadium Oxide Films

Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering

2022 ◽  
Vol 40 (1) ◽  
pp. 013405
Author(s):  
Nilton Francelosi A. Neto ◽  
Cristiane Stegemann ◽  
Lucas J. Affonço ◽  
Douglas M. G. Leite ◽  
José H. D. da Silva
Keyword(s):  
Cobalt Oxide ◽  
Flow Rate ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

10.3791/59929 ◽  
2019 ◽  
Author(s):  
Silvia L. Fernandes ◽  
Lucas J. Affonço ◽  
Roberto A. R. Junior ◽  
José H. D. da Silva ◽  
Elson Longo ◽  
...  
Keyword(s):  
Flow Rate ◽  
Niobium Oxide ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Effect Of Oxygen

Synthesis and characterization of vanadium oxide films by post-oxidation and reactive sputtering

2007 ◽  
Vol 141 (3) ◽  
pp. 108-114 ◽  
Author(s):  
A. Khodin ◽  
Hak-In Hwang ◽  
Sung-Min Hong ◽  
V. Zalessky ◽  
T. Leonova ◽  
...  
Keyword(s):  
Vanadium Oxide ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Synthesis And Characterization ◽  
Vanadium Oxide Films

Stability of the Vanadium Oxide Films Forme by Reactive Sputtering and Ion Beam Enhanced Deposition Methods

2011 ◽  
Vol 399-401 ◽  
pp. 589-592 ◽  
Author(s):  
Chang Liu ◽  
Mei Ping Jiang ◽  
Jin Hua Li ◽  
Sa Ke Wang
Keyword(s):  
Oxide Film ◽  
Vanadium Oxide ◽  
Vanadium Dioxide ◽  
Infrared Imaging ◽  
Ion Beam ◽  
Infrared Detector ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Fatigue Tests ◽  
Vanadium Oxide Films

Vanadium oxide film is a common sensing film for infrared detector and uncooled infrared imaging devices, its stability directly affects the use of the thetse infrared devices.In this paper, high and low temperature cycles fatigue tests was used to check and compare the stability of the vanadium oxide films formed by different methods.The change of the temperature coefficient of resistance(TCR) and the room temperature resistance were measured and compared for the vanadium oxide film prepared by reactive sputtering and vanadium dioxide films by Ion Beam Enhanced Deposition(IBED) method. The result indicated tungsten doped Vanadium dioxide film by IBED is the most stable and has a higher TCR.

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