Influence of discharge power and annealing temperature on the properties of indium tin oxide thin films prepared by pulsed-DC magnetron sputtering

Vacuum ◽  
2015 ◽  
Vol 121 ◽  
pp. 187-193 ◽  
Author(s):  
Mei Huang ◽  
Ziv Hameiri ◽  
Armin G. Aberle ◽  
Thomas Mueller
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Annealing Temperature ◽  
Discharge Power ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Vacuum ◽  
2009 ◽  
Vol 83 ◽  
pp. S91-S94 ◽  
Author(s):  
Jurgita Čyvienė ◽  
Edvinas Navickas ◽  
Darius Milčius ◽  
Giedrius Laukaitis
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Photoelectrochemical properties of nitrogen-doped indium tin oxide thin films prepared by reactive DC magnetron sputtering

2009 ◽  
Vol 518 (5) ◽  
pp. 1581-1584 ◽  
Author(s):  
Kee-Rong Wu ◽  
Chung-Wei Yeh ◽  
Chung-Hsuang Hung ◽  
Li-Hsun Cheng ◽  
Chih-Yuan Chung
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectrochemical Properties ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Nitrogen Doped
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