Behaviors of carrier concentrations and mobilities in indium–tin oxide thin films by DC magnetron sputtering at various oxygen flow rates

Vacuum ◽  
2004 ◽  
Vol 77 (1) ◽  
pp. 69-77 ◽  
Author(s):  
Ho-Chul Lee ◽  
O. Ok Park
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxygen Flow ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Flow Rates

Photoelectrochemical properties of nitrogen-doped indium tin oxide thin films prepared by reactive DC magnetron sputtering

2009 ◽  
Vol 518 (5) ◽  
pp. 1581-1584 ◽  
Author(s):  
Kee-Rong Wu ◽  
Chung-Wei Yeh ◽  
Chung-Hsuang Hung ◽  
Li-Hsun Cheng ◽  
Chih-Yuan Chung
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectrochemical Properties ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Nitrogen Doped

scholarly journals Properties of Indium Tin Oxide Thin Films According to Oxygen Flow Rates by γ-FIB System

2012 ◽  
Vol 21 (6) ◽  
pp. 333-341 ◽  
Author(s):  
D.H. Kim ◽  
C.H. Son ◽  
M.S. Yun ◽  
K.A. Lee ◽  
T.H. Jo ◽  
...  
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxygen Flow ◽  
Oxide Thin Films ◽  
Flow Rates

Deposition by magnetron sputtering and characterization of indium tin oxide thin films

2007 ◽  
Vol 515 (16) ◽  
pp. 6489-6492 ◽  
Author(s):  
A.V. Mudryi ◽  
A.V. Ivaniukovich ◽  
A.G. Ulyashin
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Thin Films
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