Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 165 ◽  
pp. 246-253 ◽  
Author(s):  
Bibhuti B. Sahu ◽  
Long Wen ◽  
Seok H. Kim ◽  
Jeon G. Han
Keyword(s):  
Magnetron Sputtering ◽  
Large Area ◽  
Planar Magnetron ◽  
Plasma Characteristic ◽  
Ito Films

CdS and CdTe Large Area Thin Films Processed by Radio-Frequency Planar-Magnetron Sputtering

2001 ◽  
Vol 668 ◽  
Author(s):  
H. Hernández-Contreras ◽  
G. Contreras-Puente ◽  
J. Aguilar-Hernández ◽  
A. Morales-Acevedo ◽  
J. Vidal-Larramendi ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Growth Parameters ◽  
Soda Lime ◽  
Chamber Pressure ◽  
Large Area ◽  
Planar Magnetron ◽  
Free Films ◽  
Substrate Temperatures

ABSTRACTThe processing of large area thin films solar cells represents a challenge, mainly due to the need for optimal setting of the critical growth parameters for scaling-up of the processes that guarantee homogeneous properties in the sub-minimodule architecture. We have been working with a Radio-Frequency Planar Magnetron Sputtering (RF-PMS) system, processing 450 cm2 areas of CdS and CdTe thin films grown on soda lime glasses and conducting glasses (SnO2:F-7ω/ ) for CdS, using for it a 6” balanced gun. The films have been processed with substrate temperatures (Ts) of 250°C, Ar chamber-pressure of 20 mTorr, and radio frequency power of 300 watts. The films were characterized by morphological, optical and electrical techniques, presenting in this work the corresponding measurements. Our results show that the better polycrystalline perfection, adherence and pinhole free films are obtained at substrate temperatures of 250°C.

CdS and CdTe large area thin films processed by radio-frequency planar-magnetron sputtering

2002 ◽  
Vol 403-404 ◽  
pp. 148-152 ◽  
Author(s):  
H Hernández-Contreras ◽  
G Contreras-Puente ◽  
J Aguilar-Hernández ◽  
A Morales-Acevedo ◽  
J Vidal-Larramendi ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Large Area ◽  
Planar Magnetron

Role of annealing environment on the performances of large area ITO films produced by rf magnetron sputtering

2005 ◽  
Vol 487 (1-2) ◽  
pp. 271-276 ◽  
Author(s):  
P. Canhola ◽  
N. Martins ◽  
L. Raniero ◽  
S. Pereira ◽  
E. Fortunato ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Large Area ◽  
Ito Films

Large-area CsPbBr3 perovskite films grown with effective one-step RF-magnetron sputtering

2021 ◽  
Vol 129 (24) ◽  
pp. 245303
Author(s):  
Fan Xu ◽  
Yujiao Li ◽  
Beilei Yuan ◽  
Yongzheng Zhang ◽  
Haoming Wei ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Large Area ◽  
One Step

Transparent conducting zinc-co-doped ITO films prepared by magnetron sputtering

2000 ◽  
Vol 373 (1-2) ◽  
pp. 189-194 ◽  
Author(s):  
Tadatsugu Minami ◽  
Takashi Yamamoto ◽  
Yukinobu Toda ◽  
Toshihiro Miyata
Keyword(s):  
Magnetron Sputtering ◽  
Transparent Conducting ◽  
Co Doped ◽  
Ito Films

On‐axis dc magnetron sputtering of large area high quality YBa2Cu3O7superconducting thin films

1992 ◽  
Vol 61 (3) ◽  
pp. 348-350 ◽  
Author(s):  
Y. Z. Zhang ◽  
L. Li ◽  
Y. Y. Zhao ◽  
B. R. Zhao ◽  
J. W. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Large Area ◽  
High Quality
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