scholarly journals A model for isotropic crystal growth from vapor on a patterned substrate

2002 ◽  
Vol 235 (1-4) ◽  
pp. 425-438 ◽  
Author(s):  
M Khenner ◽  
R.J Braun ◽  
M.G Mauk
Keyword(s):  
Crystal Growth ◽  
Patterned Substrate ◽  
Growth From Vapor

scholarly journals Depth-hoar growth rates near a rocky outcrop

1998 ◽  
Vol 44 (148) ◽  
pp. 477-484 ◽  
Author(s):  
E. M. Arons ◽  
S. C. Colbeck ◽  
J. M. N.T. Gray
Keyword(s):  
Crystal Growth ◽  
Snow Depth ◽  
Late Winter ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Local Distribution ◽  
Snow Properties ◽  
Rocky Outcrop ◽  
Rocky Outcrops ◽  
Growth From Vapor

Abstract Observations of slab-avalanche releases in alpine terrain have led to the hypothesis that rocky outcrops can influence the spatial distributions of temperature and heal flow in dry alpine snow covers and Unis control the local distribution of depth hoar. We investigate the effects of terrain on crystal growth by using a two-dimensional finite-clemcnl model of heal How coupled with a model of crystal growth from vapor. We used the model to examine the influence of snow properties, terrain geometry and snow depth on this phenomenon. The efleel is stronger in the early winter than in the late winter, because the rock has then had time to cool. In all cases, we found that depth-hoar growth occurs preferentially over the rock. This suggests that snow-pit investigations made over soil can he misleading if rocky outcrops are present.

scholarly journals Depth-hoar growth rates near a rocky outcrop

1998 ◽  
Vol 44 (148) ◽  
pp. 477-484
Author(s):  
E. M. Arons ◽  
S. C. Colbeck ◽  
J. M. N.T. Gray
Keyword(s):  
Crystal Growth ◽  
Snow Depth ◽  
Late Winter ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Local Distribution ◽  
Snow Properties ◽  
Rocky Outcrop ◽  
Rocky Outcrops ◽  
Growth From Vapor

AbstractObservations of slab-avalanche releases in alpine terrain have led to the hypothesis that rocky outcrops can influence the spatial distributions of temperature and heal flow in dry alpine snow covers and Unis control the local distribution of depth hoar. We investigate the effects of terrain on crystal growth by using a two-dimensional finite-clemcnl model of heal How coupled with a model of crystal growth from vapor. We used the model to examine the influence of snow properties, terrain geometry and snow depth on this phenomenon. The efleel is stronger in the early winter than in the late winter, because the rock has then had time to cool. In all cases, we found that depth-hoar growth occurs preferentially over the rock. This suggests that snow-pit investigations made over soil can he misleading if rocky outcrops are present.

Numerical simulation on dumping of convection by rotating a horizontal cylinder during crystal growth from vapor

1998 ◽  
Vol 192 (1-2) ◽  
pp. 328-334 ◽  
Author(s):  
S. Fujiwara ◽  
Y. Watanabe ◽  
Y. Namikawa ◽  
T. Keishi ◽  
K. Matsumoto ◽  
...  
Keyword(s):  
Numerical Simulation ◽  
Crystal Growth ◽  
Horizontal Cylinder ◽  
Growth From Vapor

Nonlinear interaction of macrosteps on vicinal surfaces at crystal growth from vapor

2020 ◽  
Vol 530 ◽  
pp. 125296
Author(s):  
O.P. Kulyk ◽  
V.I. Tkachenko ◽  
O.V. Podshyvalova ◽  
V.A. Gnatyuk ◽  
T. Aoki
Keyword(s):  
Crystal Growth ◽  
Nonlinear Interaction ◽  
Vicinal Surfaces ◽  
Growth From Vapor

scholarly journals Surface in the studies of crystal growth from vapor phase.

Hyomen Kagaku ◽  
1985 ◽  
Vol 6 (1) ◽  
pp. 64-66
Author(s):  
Koichi MATSUMOTO
Keyword(s):  
Crystal Growth ◽  
Vapor Phase ◽  
Growth From Vapor

Montmorillonite Dendrites

1974 ◽  
Vol 32 ◽  
pp. 454-455
Author(s):  
Necip Güven ◽  
Rodney W. Pease
Keyword(s):  
Crystal Growth ◽  
Growth Mechanism ◽  
Growth Front ◽  
Morphological Features ◽  
Dendritic Crystal ◽  
Crystal Growth Mechanism

Morphological features of montmorillonite aggregates in a large number of samples suggest that they may be formed by a dendritic crystal growth mechanism (i.e., tree-like growth by branching of a growth front).

TEM and cathodoluminescence of precipitates in II-VI semiconductors

1988 ◽  
Vol 46 ◽  
pp. 488-489
Author(s):  
Joanna L. Batstone
Keyword(s):  
Crystal Growth ◽  
Band Gap ◽  
Local Strain ◽  
Wide Band ◽  
Optoelectronic Device ◽  
Wide Band Gap ◽  
Bulk Crystal Growth ◽  
Transmission Electron ◽  
Device Applications ◽  
Stoichiometry Control

Interest in II-VI semiconductors centres around optoelectronic device applications. The wide band gap II-VI semiconductors such as ZnS, ZnSe and ZnTe have been used in lasers and electroluminescent displays yielding room temperature blue luminescence. The narrow gap II-VI semiconductors such as CdTe and HgxCd1-x Te are currently used for infrared detectors, where the band gap can be varied continuously by changing the alloy composition x.Two major sources of precipitation can be identified in II-VI materials; (i) dopant introduction leading to local variations in concentration and subsequent precipitation and (ii) Te precipitation in ZnTe, CdTe and HgCdTe due to native point defects which arise from problems associated with stoichiometry control during crystal growth. Precipitation is observed in both bulk crystal growth and epitaxial growth and is frequently associated with segregation and precipitation at dislocations and grain boundaries. Precipitation has been observed using transmission electron microscopy (TEM) which is sensitive to local strain fields around inclusions.

STM studies of crystal growth

1991 ◽  
Vol 49 ◽  
pp. 374-375
Author(s):  
M. G. Lagally
Keyword(s):  
Crystal Growth ◽  
Molecular Beam ◽  
Chemical Vapor ◽  
Sputter Deposition ◽  
Field Of View ◽  
Scanning Tunneling ◽  
Wide Field ◽  
Tunneling Microscopy ◽  
Wide Field Of View ◽  
The One

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.

Cristal-growth dynamics of n-doped gaAs

1992 ◽  
Vol 50 (2) ◽  
pp. 1544-1545
Author(s):  
Pham V. Huong ◽  
Stéphanie Bouchet ◽  
Jean-Claude Launay
Keyword(s):  
Crystal Growth ◽  
Spatial Resolution ◽  
Epitaxial Layer ◽  
Outer Surface ◽  
Gaas Substrate ◽  
Structural Modification ◽  
Growth Dynamics ◽  
Argon Laser ◽  
High Anisotropy ◽  
Crystal Gaas

Microstructure of epitaxial layers of doped GaAs and its crystal growth dynamics on single crystal GaAs substrate were studied by Raman microspectroscopy with a Dilor OMARS instrument equipped with a 1024 photodiode multichannel detector and a ion-argon laser Spectra-Physics emitting at 514.5 nm.The spatial resolution of this technique, less than 1 μm2, allows the recording of Raman spectra at several spots in function of thickness, from the substrate to the outer deposit, including areas around the interface (Fig.l).The high anisotropy of the LO and TO Raman bands is indicative of the orientation of the epitaxial layer as well as of the structural modification in the deposit and in the substrate at the interface.With Sn doped, the epitaxial layer also presents plasmon in Raman scattering. This fact is already very well known, but we additionally observed that its frequency increases with the thickness of the deposit. For a sample with electron density 1020 cm-3, the plasmon L+ appears at 930 and 790 cm-1 near the outer surface.

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