CW laser annealing of boron and arsenic-implanted silicon; electrical properties, crystalline structure and limitations
1982 ◽
Vol 17
(12)
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pp. 783-786
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2001 ◽
Vol 206-213
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pp. 1393-1396
1985 ◽
Vol 28
(4)
◽
pp. 339-344
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1996 ◽
Vol 5
(6-8)
◽
pp. 741-746
◽
2019 ◽
Vol 97
◽
pp. 62-66
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