Surface reaction processes in C4F8 and C5F8 plasmas for selective etching of SiO2 over photo-resist
2001 ◽
Vol 390
(1-2)
◽
pp. 134-138
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1986 ◽
Vol 7
◽
pp. 235-242
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Keyword(s):
2019 ◽
Vol 123
(40)
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pp. 8717-8725
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1991 ◽
Vol 30
(Part 1, No. 11B)
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pp. 3215-3218
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Keyword(s):
1985 ◽
Vol 3
(3)
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pp. 1472-1473
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