Chemical modifications are expected to be the major type of side-effect in the UV laser
processing of molecular substrates. For their systematic characterization, studies on
polymeric systems consisting of poly(methyl methacrylate) and polystyrene films doped
with aromatic dopants exemplifying different degrees of photoreactivity are undertaken. In
particular, the dependence of the nature and extent of the modifications on chromophore
properties and laser parameters (laser fluence, wavelength, and number of pulses) is
examined. The substrate absorptivity and the number of employed laser pulses turn out to
be the critical parameters in determining the quantity and nature of photoproducts that
remain in the substrate. The implications of these results for the optimisation of laser
processing of molecular/organic solids are discussed. It is suggested that the importance of
employing relatively strongly absorbed wavelengths in laser processing may relate, besides
the efficient etching and good surface morphology, to the minimization of the chemical
modifications. In contrast, irradiation with successive laser pulses is indicated to be highly
disadvantageous for the chemical integrity of the substrate. In all, the study of such model
systems appears to be most appropriate for establishing criteria for the systematic
optimisation of laser processing techniques of molecular substrates.
Pulsed UV Laser Processing of Carbosilane and Silazane Polymers