Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films
1997 ◽
Vol 120
(3-4)
◽
pp. 243-249
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Keyword(s):
1995 ◽
Vol 13
(2)
◽
pp. 268-275
◽
Keyword(s):
Keyword(s):
2006 ◽
Vol 7
(1)
◽
pp. 56-61
◽
2010 ◽
Vol 10
(1)
◽
pp. 272-278
◽
1999 ◽
Vol 28
(1)
◽
pp. 26-34
◽
1993 ◽
Vol 68
(3)
◽
pp. 319-325
◽
Keyword(s):
1988 ◽
Vol 33-34
◽
pp. 898-904
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