Tribological and corrosive properties of silver thin films prepared by e-beam ion plating method

2003 ◽  
Vol 169-170 ◽  
pp. 695-698 ◽  
Author(s):  
Kyung-Hwang Lee ◽  
Osamu Takai ◽  
Myeong-Hoon Lee
Keyword(s):  
Thin Films ◽  
Ion Plating ◽  
Plating Method ◽  
Silver Thin Films

Doping properties of ZnO thin films for photovoltaic devices grown by URT-IP (ion plating) method

2004 ◽  
Vol 451-452 ◽  
pp. 219-223 ◽  
Author(s):  
K. Iwata ◽  
T. Sakemi ◽  
A. Yamada ◽  
P. Fons ◽  
K. Awai ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Photovoltaic Devices ◽  
Ion Plating ◽  
Plating Method

Growth and electrical properties of ZnO thin films deposited by novel ion plating method

2003 ◽  
Vol 445 (2) ◽  
pp. 274-277 ◽  
Author(s):  
K. Iwata ◽  
T. Sakemi ◽  
A. Yamada ◽  
P. Fons ◽  
K. Awai ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Zno Thin Films ◽  
Ion Plating ◽  
Plating Method

scholarly journals Friction Properties and Film Strength of C60 Fullerene Thin Films Deposited by Ion Plating Method

1997 ◽  
Vol 105 (1225) ◽  
pp. 756-760 ◽  
Author(s):  
Seiichiro HIRONAKA ◽  
Toshiaki ASAKAWA ◽  
Mamoru YOSHIMOTO ◽  
Hideomi KOINUMA
Keyword(s):  
Thin Films ◽  
C60 Fullerene ◽  
Ion Plating ◽  
Plating Method

Preparation of MgO Thin Films by Ion-Plating Method.

2002 ◽  
Vol 110 (1279) ◽  
pp. 204-207 ◽  
Author(s):  
Akira KATOU ◽  
Hiroshi KAJIYAMA ◽  
Ken-ich ONISAWA ◽  
Tetsurou MINEMURA ◽  
Kazuo UETANI ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Plating ◽  
Plating Method

scholarly journals Secondary Electron Emission Characteristics of MgO Thin Films Prepared by an Advanced Ion-Plating Method

2001 ◽  
Vol 42 (9) ◽  
pp. 1870-1873 ◽  
Author(s):  
Kazuo Uetani ◽  
Hiroshi Kajiyama ◽  
Akira Kato ◽  
Akiko Takagi ◽  
Takanobu Hori ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Emission Characteristics ◽  
Ion Plating ◽  
Plating Method

Highly (111) Oriented Al Thin Films by Ion-Plating Method Using Discharge Plasma

2001 ◽  
Vol 714 ◽  
Author(s):  
Shin Masui ◽  
Kimio Kinoshita ◽  
Susumu Sakuragi ◽  
Toshio Kudo ◽  
Shinji Takayama
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Discharge Plasma ◽  
Substrate Surface ◽  
Plasma Cleaning ◽  
Film Properties ◽  
Ion Plating ◽  
Oriented Film ◽  
Plating Method ◽  
Hillock Formation

ABSTRACTApplication to aluminum deposition using ion-plating method is described. This method has several superior features for generating highly (111) orientation. The origin of this orientation and surface roughness are discussed in connection with a kinetic energy of the ions. The film properties thus made were compared with those of a conventional sputtered film. The higher (111) oriented film showed high resistance against hillock formation even after annealing at high temperatures. An effect of a plasma cleaning of substrate surface was confirmed to be quite helpful for promotion of (111) preferred orientation.

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