Mechanical properties of (Ti,Cr)N coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering

2003 ◽  
Vol 169-170 ◽  
pp. 424-427 ◽  
Author(s):  
D.H. Jung ◽  
H.S. Park ◽  
H.D. Na ◽  
J.W. Lim ◽  
J.J. Lee ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled ◽  
Direct Current Magnetron Sputtering

THICKNESS DEPENDENCE OF BUCKLING PATTERNS OF Ta FILMS SPUTTERED ON GLASS SUBSTRATES

2012 ◽  
Vol 19 (03) ◽  
pp. 1250022 ◽  
Author(s):  
YONG-JU ZHANG ◽  
SEN-JIANG YU ◽  
HONG ZHOU ◽  
MIAO-GEN CHEN ◽  
ZHI-WEI JIAO
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Compressive Stress ◽  
Direct Current ◽  
Thickness Dependence ◽  
Elastic Theory ◽  
Geometrical Parameters ◽  
Glass Substrates ◽  
Direct Current Magnetron Sputtering

Tantalum (Ta) films deposited on glass substrates have been prepared by a direct current magnetron sputtering method, and buckling patterns induced by residual compressive stress are investigated in detail. When the film thickness increases, the buckling morphologies evolve from straight-sided buckle network to wavy or wormlike wrinkles gradually, and finally change into telephone cord buckles. The geometrical parameters of the buckling patterns are found to increase linearly with the film thickness. Based on the geometrical parameters of the buckling patterns, the mechanical properties of the Ta films are also discussed in the frame of continuum elastic theory.

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