On the reliability of quantitative phase measurements by low magnification off-axis image plane electron holography

1998 ◽  
Vol 72 (3-4) ◽  
pp. 101-107 ◽  
Author(s):  
B.G Frost ◽  
E Voelkl
Author(s):  
B.G. Frost ◽  
D.C. Joy ◽  
L.F. Allard ◽  
E. Voelkl

A wide holographic field of view (up to 15 μm in the Hitachi-HF2000) is achieved in a TEM by switching off the objective lens and imaging the sample by the first intermediate lens. Fig.1 shows the corresponding ray diagram for low magnification image plane off-axis holography. A coherent electron beam modulated by the sample in its amplitude and its phase is superimposed on a plane reference wave by a negatively biased Möllenstedt-type biprism.Our holograms are acquired utilizing a Hitachi HF-2000 field emission electron microscope at 200 kV. Essential for holography are a field emission gun and an electron biprism. At low magnification, the excitation of each lens must be appropriately adjusted by the free lens control mode of the microscope. The holograms are acquired by a 1024 by 1024 slow-scan CCD-camera and processed by the “Holoworks” software. The hologram fringes indicate positively and negatively charged areas in a sample by the direction of the fringe bending (Fig.2).


Author(s):  
Hannes Lichte

Generally, the electron object wave o(r) is modulated both in amplitude and phase. In the image plane of an ideal imaging system we would expect to find an image wave b(r) that is modulated in exactly the same way, i. e. b(r) =o(r). If, however, there are aberrations, the image wave instead reads as b(r) =o(r) * FT(WTF) i. e. the convolution of the object wave with the Fourier transform of the wave transfer function WTF . Taking into account chromatic aberration, illumination divergence and the wave aberration of the objective lens, one finds WTF(R) = Echrom(R)Ediv(R).exp(iX(R)) . The envelope functions Echrom(R) and Ediv(R) damp the image wave, whereas the effect of the wave aberration X(R) is to disorder amplitude and phase according to real and imaginary part of exp(iX(R)) , as is schematically sketched in fig. 1.Since in ordinary electron microscopy only the amplitude of the image wave can be recorded by the intensity of the image, the wave aberration has to be chosen such that the object component of interest (phase or amplitude) is directed into the image amplitude. Using an aberration free objective lens, for X=0 one sees the object amplitude, for X= π/2 (“Zernike phase contrast”) the object phase. For a real objective lens, however, the wave aberration is given by X(R) = 2π (.25 Csλ3R4 + 0.5ΔzλR2), Cs meaning the coefficient of spherical aberration and Δz defocusing. Consequently, the transfer functions sin X(R) and cos(X(R)) strongly depend on R such that amplitude and phase of the image wave represent only fragments of the object which, fortunately, supplement each other. However, recording only the amplitude gives rise to the fundamental problems, restricting resolution and interpretability of ordinary electron images:


2003 ◽  
Author(s):  
Daniel J. Townsend ◽  
Kregg D. Quarles ◽  
Anthony L. Thomas ◽  
Willie S. Rockward ◽  
Carol M. Warner ◽  
...  

Author(s):  
Akira Tonomura

In electron microscopy, the intensity of an electron beam transmitted through an object can be observed. While in electron holography, the phase of the electron beam can also be observed and displayed as an interference micrograph. Using a technique unique to holography, the precision of phase measurements can be increased to 1/100 of the electron wavelength. An interference micrograph of a magnetic object can be interpreted in a straightforward way: Contour fringes directly indicate projected magnetic flux lines and a constant magnetic flux of h/e (= 4 × 10-15 Wb) flows between two adjacent fringes (See Fig. 1).Examples of magnetic recordings are shown in Fig. 2. Flux lines inside and outside of the magnetic tapes, recorded in different ways, can directly and quantitatively be observed as interference micrographs. Figure 2 (a) shows an example of in-plane magnetic recording. Two magnetization streams, pointed in opposite directions, merge and produce vortices in the transition region similar to those produced by streams of water.


2015 ◽  
Vol 21 (6) ◽  
pp. 1406-1412 ◽  
Author(s):  
Zhaofeng Gan ◽  
Michael DiNezza ◽  
Yong-Hang Zhang ◽  
David J. Smith ◽  
Martha R. McCartney

AbstractThe mean inner potential (MIP) and inelastic mean free path (IMFP) of undoped ZnTe are determined using a combination of off-axis electron holography and convergent beam electron diffraction. The ZnTe MIP is measured to be 13.7±0.6 V, agreeing with previously reported simulations, and the IMFP at 200 keV is determined to be 46±2 nm for a collection angle of 0.75 mrad. Dynamical effects affecting holographic phase imaging as a function of incident beam direction for several common semiconductors are systematically studied and compared using Bloch wave simulations. These simulation results emphasize the need for careful choice of specimen orientation when carrying out quantitative electron holography studies in order to avoid erroneous phase measurements.


2010 ◽  
Vol 110 (5) ◽  
pp. 375-382 ◽  
Author(s):  
Martha R. McCartney ◽  
Nipun Agarwal ◽  
Suk Chung ◽  
David A. Cullen ◽  
Myung-Geun Han ◽  
...  

2016 ◽  
Vol 56 (3) ◽  
pp. 031213 ◽  
Author(s):  
Mark F. Spencer ◽  
Robert A. Raynor ◽  
Matthias T. Banet ◽  
Dan K. Marker

1999 ◽  
Vol 5 (S2) ◽  
pp. 946-947
Author(s):  
M. Elfwing ◽  
M. Saunders ◽  
E. Olsson

ZnO varistor materials are polycrystalline materials that exhibit strong non-linear current-voltage characteristics. Their non-ohmic behaviour makes them suitable for overvoltage protection devices. It is the interfaces between ZnO grains that are the key to the non-linear behaviour of the varistor materials. Previous work has shown that the local microstructure determines the breakdown voltage of the individual ZnO/ZnO interface [1]. The pre-breakdown conductivity and the non-linearity in the breakdown region, which are both crucial to the performance of the varistor, are also affected by the height and the width of the potential barriers. In the present work, electron holography has been used to investigate the potential barriers in ZnO varistor materials.Electron holograms were recorded at 200kV using a Hitachi HF-2000 field emission gun transmission electron microscope [2]. The electrostatic bi-prism was located near the second image plane. The bi-prism voltage was about 9 V and the fringe spacing in the holograms was about 1 nm.


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