Implications of plant spatial distribution for pollination and seed production

Author(s):  
Jaboury Ghazoul
2016 ◽  
Vol 44 (3) ◽  
pp. 411-418 ◽  
Author(s):  
A. C. V. Lima ◽  
C. F. Wilcken ◽  
P. J. Ferreira-Filho ◽  
J. E. Serrão ◽  
J. C. Zanuncio

2016 ◽  
Vol 8 (2) ◽  
pp. 141
Author(s):  
Dharmalingam Selvakumar ◽  
Kumaran Velayudham ◽  
Nallasamy Thavaprakaash

<p class="1">Altering plant spatial distribution induces changes in micro-meteorology of crop canopy and have cumulative effect on yield. Creation of suitable plant spatial distribution is indispensable to explore the beneficial effects of spatial pattern and it could be possible only through altering rectangular spatial distribution, which is commonly practiced in maize. Most of the nitrogen (N) scheduling approaches are growth stages based without considering crop demand and soil fertility status which may not yield better, warrants need based N management for better production in maize. The present study has investigated effects of spatial pattern and nitrogen scheduling on intercepted photosynthetically active radiation (IPAR), light extinction co-efficient (‘k’), leaf temperature (LT) and productivity of maize. The experiments were conducted during 2011 and 2012 at Tamil Nadu Agricultural University, Coimbatore. Treatments were laid out in split-plot design and replicated thrice. Treatments were: six levels of spatial pattern (60 × 25, 30 × 30, 35 × 35, 40 × 40, 45 × 45 and 50 × 50 cm). Growth stage based and need based approach of leaf color chart based (LCC) nitrogen scheduling were imposed. Field experimental results indicated that maize canopy under 30 × 30 and 35 × 35 cm spatial pattern intercepted 10 to 15% more light compared to rectangular pattern (60 × 25 cm). The ‘k’ value and leaf temperature were reduced under this pattern. Higher maize grain yield (GY) was recorded at 35 × 35 cm spatial distribution. The LCC based N scheduling recorded higher values of IPAR, LT and lower ‘k’ values. Square planting favored canopy micro-meterological parameters and which in turn enhanced grain yield of maize.</p>


2012 ◽  
pp. no-no ◽  
Author(s):  
Matthew H. Holden ◽  
Stephen P. Ellner ◽  
Doo-Hyung Lee ◽  
Jan P. Nyrop ◽  
John P. Sanderson

2011 ◽  
Vol 144 (1) ◽  
pp. 19-28 ◽  
Author(s):  
Pejman Tahmasebi Kohyani ◽  
Beatrijs Bossuyt ◽  
Dries Bonte ◽  
Maurice Hoffmann

1991 ◽  
Vol 123 (1) ◽  
pp. 205-210 ◽  
Author(s):  
Barbara A. Bates ◽  
Michael J. Weiss

AbstractThe within-plant spatial distribution of Limothrips denticornis Haliday eggs on spring barley (Hordeum vulgare L.) in North Dakota was examined during the growing seasons of 1987 and 1988. In both years, most eggs were found during inflorescence emergence (growth stages 10–10.5 on the Feekes scale), although eggs were detected both prior to and after these growth stages. Once inflorescence emergence was initiated, over 8.5% of the eggs were found in the top two leaf sheaths, with the majority in the flag leaf sheath. Over all barley growth stages, significantly more eggs (P≤0.05) were found in the middle third than in either the top or bottom third of the flag leaf sheath. No difference (P≥0.05) in the within-sheath location of eggs on lower leaves was detected.


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
Jayesh Bellare

Seeing is believing, but only after the sample preparation technique has received a systematic study and a full record is made of the treatment the sample gets.For microstructured liquids and suspensions, fast-freeze thermal fixation and cold-stage microscopy is perhaps the least artifact-laden technique. In the double-film specimen preparation technique, a layer of liquid sample is trapped between 100- and 400-mesh polymer (polyimide, PI) coated grids. Blotting against filter paper drains excess liquid and provides a thin specimen, which is fast-frozen by plunging into liquid nitrogen. This frozen sandwich (Fig. 1) is mounted in a cooling holder and viewed in TEM.Though extremely promising for visualization of liquid microstructures, this double-film technique suffers from a) ireproducibility and nonuniformity of sample thickness, b) low yield of imageable grid squares and c) nonuniform spatial distribution of particulates, which results in fewer being imaged.


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