Sculpting Optical Properties of Thin Film IR Filters through Nanocrystal Synthesis and Additive, Solution Processing

2020 ◽  
Vol 32 (19) ◽  
pp. 8683-8693
Author(s):  
Raina A. Krivina ◽  
Tawney A. Knecht ◽  
Brandon M. Crockett ◽  
Shannon W. Boettcher ◽  
James E. Hutchison
2015 ◽  
Vol 11 (2) ◽  
pp. 3017-3022
Author(s):  
Gurban Akhmedov

Results of researches show, that film p-n the structures received by a method of discrete thermal evaporation in a uniform work cycle, are suitable for use in low-voltage devices.  As a result of work are received p-n heterojunctions in thin-film execution, described by high values of differential resistance. Show that, thermo endurance - T0 maybe using as characteristic of thermo endurance of optic materials. If heating flow, destruction temperature and internal surface temperature is measured during test, it is possible to determine value T0 and other necessity characteristics. As a result of the taking test was lead to comparison evaluation of considered materials. Working range of heating flow and up level heating embark have been determined.


Coatings ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 821
Author(s):  
Aneeqa Bashir ◽  
Mehwish Farooq ◽  
Abdul Malik ◽  
Shahzad Naseem ◽  
Arshad Saleem Bhatti

An environmentally friendlier solution processing has been introduced to fabricate zirconium oxide (ZrO2) films on quartz substrates, using spin coating of simple water-based solution. The films cured with UV-A = 330 nm for different times (40, 80, 120 min) were investigated for structural and optical properties and compared with thermally annealed film (at 350 °C). XRD and Raman spectroscopy showed amorphous structure in all the samples with no significant phase transformation with UV-A exposure. AFM microscopy showed smooth and crack free films with surface roughness ≤2 nm that reduced with UV-A exposure. Ultraviolet-visible (UV–Vis) spectroscopy demonstrated optical transmittance ≥88% and energy band gap variations as 4.52–4.70 eV. Optical constants were found from spectroscopic ellipsometry (SE). The refractive index (n) values, measured at 470 nm increased from 1.73 to 2.74 as the UV-A exposure prolonged indicating densification and decreasing porosity of the films. The extinction coefficient k decreased from 0.32 to 0.19 indicating reduced optical losses in the films under the UV-A exposure. The photoluminescence (PL) spectra exhibited more pronounced UV emissions which grew intense with UV-A exposure thereby improving the film quality. It is concluded that UV-A irradiation can significantly enhance the optical properties of ZrO2 films with minimal changes induced in the structure as compared to thermally treated film. Moreover, the present work indicates that water-based solution processing has the potential to produce high-quality ZrO2 films for low cost and environmental friendlier technologies. The work also highlights the use of UV-A radiations as an alternate to high temperature thermal annealing for improved quality.


2021 ◽  
Vol 528 ◽  
pp. 167803
Author(s):  
Sergey Lyaschenko ◽  
Olga Maximova ◽  
Dmitriy Shevtsov ◽  
Sergey Varnakov ◽  
Ivan Tarasov ◽  
...  

2020 ◽  
Author(s):  
Mangalika Sinha ◽  
R. K. Gupta ◽  
P. Dasilva ◽  
P. Mercere ◽  
Mohammed H. Modi

2019 ◽  
Vol 75 (3) ◽  
pp. 236-241
Author(s):  
Jun Bin Ko ◽  
Sang Chul Lim ◽  
Seong Hyun Kim

2015 ◽  
Vol 45 (1) ◽  
pp. 255-261 ◽  
Author(s):  
Suat Pat ◽  
Volkan Şenay ◽  
Soner Özen ◽  
Şadan Korkmaz

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