Aggregate-Free Micrometer-Thick Mesoporous Silica Thin Films on Planar and Three-Dimensional Structured Electrodes by Hydrodynamic Diffusion Layer Control during Electrochemically Assisted Self-Assembly

Electrochemical deposition was successfully used to prepare mesoporous silica thin films with highly ordered and vertically oriented pores. Tetraethyl orthosilicate was used as the inorganic silicon source and cetyltrimethyl ammonium bromide was the template. A negative potential was applied to the working electrode, which was initially immersed in collosol and then in hydroxyl at the electrode/solution interface. Hydroxyl ion served as the catalyst that promoted the polycondensation and self-assembly of the silicon precursor, as well as the formation of thin films with pores which are highly ordered and vertically oriented with respect to the panel.The pore arrangement of the mesoporous film was hexagonal, and its aperture was 2 nm to 3 nm. The verticality of the thin film pore was demonstrated through permeability and transmission electron microscopy analyses. The prepared mesoporous film possessed good optical amorphous antireflective property with ordered and vertically oriented pores.

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Preparation of ordered and oriented mesoporous silica thin films bearing octyl or hexadecyl groups by electrochemically assisted self-assembly and evaluation of their transport properties

Journal of Solid State Electrochemistry ◽

10.1007/s10008-014-2726-2 ◽

2015 ◽

Vol 19 (7) ◽

pp. 2075-2085 ◽

Cited By ~ 5

Author(s):

Christelle Despas ◽

Nataliya A. Vodolazkaya ◽

Jaafar Ghanbaja ◽

Alain Walcarius

Keyword(s):

Thin Films ◽

Mesoporous Silica ◽

Transport Properties ◽

Self Assembly ◽

Silica Thin Films

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Growth of Carbon Nanotubes on Mesoporous Silica Coated Planar and Three-Dimensional Surfaces

MRS Proceedings ◽

10.1557/opl.2013.521 ◽

2013 ◽

Vol 1505 ◽

Author(s):

Katrina Staggemeier ◽

Jin Ke ◽

Alison Downard ◽

Vladimir Golovko ◽

Nitin Chopra ◽

...

Keyword(s):

Thin Films ◽

Carbon Nanotubes ◽

Mesoporous Silica ◽

Nickel Foam ◽

Three Dimensional ◽

Silica Film ◽

Metal Nanostructures ◽

Sem Images ◽

Ordered Arrays ◽

Silica Thin Films

ABSTRACTWell ordered arrays of carbon nanotubes (CNTs) are of interest for a broad range of potential applications including energy storage and as catalyst supports. On some substrates such as copper and nickel, CNTs do not grow well or at all. We have previously shown that mesoporous silica thin films can be deposited onto metal substrates including copper and nickel, and that, after removal of the templating surfactant, the mesoporous silica film can be used as template for the electrodeposition of metals to give metal nanostructures.[Campbell et. al., Micro. Meso. Mater., 97, 114-121 (2006)] The size of the metal nanostructures makes them attractive as seeds for growth of CNTs. We have found that under appropriate conditions nickel deposited into mesoporous silica can act as catalyst for CNT growth on a number of different substrates including copper coated silicon wafers, and nickel foam. Using three different furnaces and different feed streams it was found that the growth is sensitive to carbon source; acetylene and ethylene both produced CNTs whereas attempts to produce CNTs using xylene have so far been unsuccessful.Well ordered mesoporous silica thin films could potentially give arrays of nanorod seeds, leading to well ordered arrays of CNTs, SEM images of some of our samples show dense CNT arrays, but do not indicate significant ordering.

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Synthesis of continuous mesoporous silica thin films with three-dimensional accessible pore structures

Chemical Communications ◽

10.1039/a804649b ◽

1998 ◽

pp. 2499-2500 ◽

Cited By ~ 101

Author(s):

Dongyuan Zhao ◽

Peidong Yang ◽

David I. Margolese ◽

Galen D. Stucky

Keyword(s):

Thin Films ◽

Mesoporous Silica ◽

Three Dimensional ◽

Pore Structures ◽

Silica Thin Films

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Development of 3-D Magnetic Nano-Arrays by Electrodeposition into Mesoporous Silica Films

MRS Proceedings ◽

10.1557/proc-0961-o07-02 ◽

2006 ◽

Vol 961 ◽

Cited By ~ 2

Author(s):

Jason Manning ◽

Roger Campbell ◽

Martin Gerard Bakker ◽

Xuefa Li ◽

Dong Ryeol Lee ◽

...

Keyword(s):

Thin Films ◽

Mesoporous Silica ◽

Self Assembly ◽

Magnetic Nanostructures ◽

Grazing Incidence ◽

Nano Particles ◽

Silica Films ◽

Silica Thin Films ◽

Current Path ◽

Wide Range

ABSTRACTThe development of periodic nanostructures fabricated by self-assembly of surfactants and block co-polymers has opened up the possibility of generating periodic magnetic nanostructures of types not accessible by self-assembly of nano-particles. The fabrication of mesoporous silica thin films around self-assembled block co-polymers is well established. Common structures for such films are SBA-15 which consists of hexagonal arrays of cylindrical pores and SBA-16 which has face centered arrays of spherical voids. These pores are connected by 1-2 nm thick flaws in the continuous silica phase producing an effectively continuous porous phase. After removal of the block co-polymer template, electrodeposition into the mesoporous silica thin films produces arrays of 5-10 nm diameter nano-wires and nano-particles. We have demonstrated that such materials can be fabricated on a wide range of metal substrates. Characterization by Scanning Electron Microscopies shows that the mesoporous silica is well ordered over micron scale areas. Grazing Incidence Small Angle X-ray Scattering (GISAXS) studies shows diffraction spots, consistent with the entire film being well ordered. GISAXS also shows that the mesoporous silica films survive removal of the template and electrodeposition of nickel and cobalt into the mesoporous silica films. Such films are of interest for their magnetic properties, as the nanophase and scale can be independently varied. Further, the presence of nanowires inside an insulator suggests that these films might also be of interest as the current confining element for Confined Current Path-Current Perpendicular to Plane GMR sensors.

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ChemInform Abstract: Synthesis of Continuous Mesoporous Silica Thin Films with Three-Dimensional Accessible Pore Structures.

ChemInform ◽

10.1002/chin.199906006 ◽

2010 ◽

Vol 30 (6) ◽

pp. no-no

Author(s):

Dongyuan Zhao ◽

Peidong Yang ◽

David I. Margolese ◽

Bradley F. Chmelka ◽

Galen D. Stucky

Keyword(s):

Thin Films ◽

Mesoporous Silica ◽

Three Dimensional ◽

Pore Structures ◽

Silica Thin Films

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Thermal Conductivity of Cubic Mesoporous Silica Thin Films

Volume 11: Micro and Nano Systems, Parts A and B ◽

10.1115/imece2007-43016 ◽

2007 ◽

Author(s):

Soojung C. Hur ◽

Laurent Pilon ◽

Adam Christensen ◽

Samuel Graham

Keyword(s):

Thin Films ◽

Thermal Conductivity ◽

Mesoporous Silica ◽

Self Assembly ◽

Room Temperature ◽

Mean Free Path ◽

Fused Silica ◽

Silica Thin Films ◽

The Cross ◽

Cubic Mesoporous

This paper reports, for the first time, the cross-plane thermal conductivity of highly ordered cubic mesoporous silica thin films with porosity of 31% and thickness ranging between 200 and 500 nm. The mesoporous thin films are synthesized based on evaporation induced self-assembly process. The pores are spherical with average inter-pore spacing and pore diameter equal to 5.95 nm and 5 nm, respectively. The thermal conductivity is measured at room temperature using the 3ω method. The experimental setup and the associated analysis are validated by comparing the thermal conductivity measurements for the silicon substrate and for high quality thermal oxide thin films with data reported in the literature. The cross-plane thermal conductivity of the synthesized mesoporous silica thin films does not strongly depend on film thickness due to the reduction in phonon mean free path caused by the presence of nanopores. The average thermal conductivity is 0.61 ± 0.011 W/mK, which is 56% lower than that of bulk fused silica at room temperature.

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