Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma

2015 ◽  
Vol 27 (17) ◽  
pp. 5988-5996 ◽  
Author(s):  
Zheng Guo ◽  
Hao Li ◽  
Qiang Chen ◽  
Lijun Sang ◽  
Lizhen Yang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
High Purity ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Copper Films ◽  
Low Resistivity ◽  
Layer Deposition

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

2011 ◽  
Vol 23 (20) ◽  
pp. 4417-4419 ◽  
Author(s):  
Thomas J. Knisley ◽  
Thiloka C. Ariyasena ◽  
Timo Sajavaara ◽  
Mark J. Saly ◽  
Charles H. Winter
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
High Purity ◽  
Atomic Layer ◽  
Copper Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Low Resistivity ◽  
Layer Deposition

Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine

2017 ◽  
Vol 29 (15) ◽  
pp. 6502-6510 ◽  
Author(s):  
Katja Väyrynen ◽  
Kenichiro Mizohata ◽  
Jyrki Räisänen ◽  
Daniel Peeters ◽  
Anjana Devi ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tertiary Butyl ◽  
Low Resistivity ◽  
Layer Deposition

Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent

2014 ◽  
Vol 26 (12) ◽  
pp. 3731-3738 ◽  
Author(s):  
Lakmal C. Kalutarage ◽  
Scott B. Clendenning ◽  
Charles H. Winter
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Copper Films ◽  
Layer Deposition

Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition

2013 ◽  
Vol 31 (1) ◽  
pp. 01A124 ◽  
Author(s):  
Tae-Hoon Jung ◽  
Jin-Seong Park ◽  
Dong-Ho Kim ◽  
Yongsoo Jeong ◽  
Sung-Gyu Park ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Plasma Treatment ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Low temperature temporal and spatial atomic layer deposition of TiO2 films

2015 ◽  
Vol 33 (4) ◽  
pp. 041512 ◽  
Author(s):  
Morteza Aghaee ◽  
Philipp S. Maydannik ◽  
Petri Johansson ◽  
Jurkka Kuusipalo ◽  
Mariadriana Creatore ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Temporal And Spatial
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