Aluminum Interdiffusion into LiCoO2 Using Atomic Layer Deposition for High Rate Lithium Ion Batteries

2018 ◽  
Vol 1 (7) ◽  
pp. 3277-3282 ◽  
Author(s):  
Takashi Teranishi ◽  
Yumi Yoshikawa ◽  
Mika Yoneda ◽  
Akira Kishimoto ◽  
Jennifer Halpin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Lithium Ion ◽  
Atomic Layer ◽  
High Rate ◽  
Layer Deposition

Significant impact on cathode performance of lithium-ion batteries by precisely controlled metal oxide nanocoatings via atomic layer deposition

2014 ◽  
Vol 247 ◽  
pp. 57-69 ◽  
Author(s):  
Xifei Li ◽  
Jian Liu ◽  
Xiangbo Meng ◽  
Yongji Tang ◽  
Mohammad Norouzi Banis ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Lithium Ion Batteries ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Layer Deposition

Plasma Enhanced Atomic Layer Deposition of Nickel and Cobalt Phosphate for Lithium Ion Batteries

2022 ◽  
Author(s):  
Lowie Henderick ◽  
Ruben Blomme ◽  
Matthias Marcus Minjauw ◽  
Jonas Keukelier ◽  
Johan Meersschaut ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Substrate Temperature ◽  
Lithium Ion Batteries ◽  
Oxygen Plasma ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Nickel Phosphate ◽  
Cobalt Phosphate

A plasma-enhanced ALD process has been developed to deposit nickel phosphate. The process combines a trimethylphosphate (TMP) plasma with an oxygen plasma and nickelocene at a substrate temperature of 300°C....

scholarly journals Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Energies ◽  
2020 ◽  
Vol 13 (9) ◽  
pp. 2345
Author(s):  
Maxim Maximov ◽  
Denis Nazarov ◽  
Aleksander Rumyantsev ◽  
Yury Koshtyal ◽  
Ilya Ezhov ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Silicon Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
X Ray ◽  
Layer Deposition ◽  
Nickel Silicon

Lithium nickelate (LiNiO2) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp2) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)2 precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li2SiO3 and Li2Si2O5 were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO2. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

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