Metal-Catalyst-Free Growth of Patterned Graphene on SiO2 Substrates by Annealing Plasma-Induced Cross-Linked Parylene for Optoelectronic Device Applications

2019 ◽  
Vol 11 (15) ◽  
pp. 14427-14436 ◽  
Author(s):  
Yibo Dong ◽  
Chuantong Cheng ◽  
Chen Xu ◽  
Xurui Mao ◽  
Yiyang Xie ◽  
...  
2010 ◽  
Author(s):  
T. Uchino ◽  
G. N. Ayre ◽  
D. C. Smith ◽  
J. L. Hutchison ◽  
C. H. de Groot ◽  
...  

2013 ◽  
Vol 25 (7) ◽  
pp. 938-938 ◽  
Author(s):  
Jianyi Chen ◽  
Yunlong Guo ◽  
Yugeng Wen ◽  
Liping Huang ◽  
Yunzhou Xue ◽  
...  

2009 ◽  
Vol 131 (6) ◽  
pp. 2094-2095 ◽  
Author(s):  
Shaoming Huang ◽  
Qiran Cai ◽  
Jiangying Chen ◽  
Yong Qian ◽  
Lijie Zhang

2009 ◽  
Vol 131 (6) ◽  
pp. 2082-2083 ◽  
Author(s):  
Bilu Liu ◽  
Wencai Ren ◽  
Libo Gao ◽  
Shisheng Li ◽  
Songfeng Pei ◽  
...  

2011 ◽  
Vol 10 (01n02) ◽  
pp. 13-17 ◽  
Author(s):  
SOUMEN DHARA ◽  
P. K. GIRI

We have grown metal catalyst free, straight Si nanowires (NWs) with high aspect ratio of about 130 on Si (100) substrate using radio frequency magnetron sputtering. Thin Si seed layer on thermally oxidized substrate was used for catalyst-free growth. Then Si deposition was done on that substrate using sputtering technique followed by heat treatment at different temperatures (900°C–1100°C). Sample heated at 1000°C results in straight, long, and uniform cylindrical shaped Si NWs with diameter 62–74 nm and length up to 8 μm, whereas sample heated above 1000°C transformed toward nanorods with larger diameter. However, no significant growth of Si NWs took place at 900°C. Sputter deposition technique provides an alternate fabrication route for Si NW synthesis. For comparison, we have also grown Au catalyst assisted Si NWs on Si (100) substrate by similar process. These nanowires also show similar morphology with diameter 48–65 nm and aspect ratio about 165. Growth mechanism and effect of growth temperatures on the structure and morphology of Si NWs are discussed.


2011 ◽  
Vol 50 (4S) ◽  
pp. 04DN02
Author(s):  
Takashi Uchino ◽  
John L. Hutchison ◽  
Greg N. Ayre ◽  
David C. Smith ◽  
Kees de Groot ◽  
...  

2011 ◽  
Vol 26 (8) ◽  
pp. 881-884 ◽  
Author(s):  
Can WANG ◽  
Liang ZHAN ◽  
Zhen-Hong HUANG ◽  
Wen-Ming QIAO ◽  
Xiao-Yi LIANG ◽  
...  

RSC Advances ◽  
2017 ◽  
Vol 7 (53) ◽  
pp. 33185-33193 ◽  
Author(s):  
Shan Zheng ◽  
Guofang Zhong ◽  
Xingyi Wu ◽  
Lorenzo D'Arsiè ◽  
John Robertson

We study the metal-catalyst-free growth of uniform and continuous graphene on different insulating substrates by microwave plasma-enhanced chemical vapor deposition (PECVD) with a gas mixture of C2H2, NH3, and H2 at a temperature of 700–750 °C.


2012 ◽  
Vol 25 (7) ◽  
pp. 992-997 ◽  
Author(s):  
Jianyi Chen ◽  
Yunlong Guo ◽  
Yugeng Wen ◽  
Liping Huang ◽  
Yunzhou Xue ◽  
...  

2011 ◽  
Vol 50 (4) ◽  
pp. 04DN02 ◽  
Author(s):  
Takashi Uchino ◽  
John L. Hutchison ◽  
Greg N. Ayre ◽  
David C. Smith ◽  
Kees de Groot ◽  
...  

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