Abstract
Valence band offsets were measured by X Ray Photoelectron Spectroscopy for SiO2 deposited by Atomic Layer Deposition on α-(AlxGa1-x)2O3 alloys with x= 0.26-0.74 grown with a continuous composition spread to enable investigations of the band alignment as a function of the alloy composition. From measurement of the core levels in the alloys, the bandgaps were determined to range from 5.8 eV (x=0.26) to 7eV (x=0.74). The valence band offsets were -1.2 eV for x=0.26, -0.2 eV for x=0.42, 0.2 eV for x=0.58 and 0.4 eV for x=0.74. Given the bandgap of the SiO2 was 8.7 eV, this led to conduction band offsets of 4.1 eV (x=0.26) to 1.3 eV (x=0.74). The band alignments were nested for x>0.5 , but at lower Al contents the conductions band offsets were negative, with a staggered band alignment. This shows the challenge of finding appropriate dielectrics for this ultra-wide bandgap semiconductor system.