scholarly journals Temperature-Dependent Influencing Mechanism of Carbon Monoxide on the NH3–SCR Process over Ceria-Based Catalysts

2021 ◽  
Author(s):  
Xiaoqiang Wang ◽  
Yue Liu ◽  
Zhongbiao Wu
Keyword(s):  
Carbon Monoxide ◽  
Temperature Dependent ◽  
Nh3 Scr ◽  
Influencing Mechanism

Carbon Monoxide Oxidation by Polyoxometalate-Supported Gold Nanoparticulate Catalysts: Activity, Stability, and Temperature- Dependent Activation Properties

2018 ◽  
Vol 130 (6) ◽  
pp. 1539-1543 ◽  
Author(s):  
Takuya Yoshida ◽  
Toru Murayama ◽  
Norihito Sakaguchi ◽  
Mitsutaka Okumura ◽  
Tamao Ishida ◽  
...  
Keyword(s):  
Carbon Monoxide ◽  
Carbon Monoxide Oxidation ◽  
Temperature Dependent ◽  
Supported Gold

Carbon Monoxide Oxidation by Polyoxometalate-Supported Gold Nanoparticulate Catalysts: Activity, Stability, and Temperature- Dependent Activation Properties

2018 ◽  
Vol 57 (6) ◽  
pp. 1523-1527 ◽  
Author(s):  
Takuya Yoshida ◽  
Toru Murayama ◽  
Norihito Sakaguchi ◽  
Mitsutaka Okumura ◽  
Tamao Ishida ◽  
...  
Keyword(s):  
Carbon Monoxide ◽  
Carbon Monoxide Oxidation ◽  
Temperature Dependent ◽  
Supported Gold

Coverage- and temperature-dependent site occupancy of carbon monoxide on Rh(111) studied by high-resolution core-level photoemission

1998 ◽  
Vol 396 (1-3) ◽  
pp. 117-136 ◽  
Author(s):  
A. Beutler ◽  
E. Lundgren ◽  
R. Nyholm ◽  
J.N. Andersen ◽  
B.J. Setlik ◽  
...  
Keyword(s):  
Carbon Monoxide ◽  
High Resolution ◽  
Site Occupancy ◽  
Core Level ◽  
Temperature Dependent ◽  
Dependent Site

scholarly journals III. The kinetics of ignition of carbon monoxide and oxygen sensitized by hydrogen

1938 ◽  
Vol 167 (930) ◽  
pp. 318-342 ◽  
Keyword(s):  
Carbon Monoxide ◽  
Preceding Paper ◽  
Lower Pressure ◽  
Temperature Dependent ◽  
Pressure Limit ◽  
Catalytic Function ◽  
Rate Of Reaction ◽  
Hydrogen Mixtures ◽  
Kinetics Of ◽  
Combustion Of Hydrogen

The results of the preceding paper have revealed that in the presence of less than 1% of hydrogen, mixtures of carbon monoxide and oxygen assume many of the characteristics of oxy-hydrogen mixtures. In both systems ignition is possible over the same range of temperatures, and in each case is confined between upper and lower pressure limits outside which the rate of reaction falls abruptly to small values. It is reasonable to suppose that the catalytic function of hydrogen is primarily to impose a branching mechanism on the carbon monoxide reaction similar to that which operates in the combustion of hydrogen is primarily to impose a branching mechanism on the carbon monoxide reaction similar to that which operates in the combustion of hydrogen itself, and that since in each case reaction will be controlled by the same elementary temperature dependent process. The object of the present work was to investigate the extent to which participation of carbon monoxide in the reaction chains alters the characteristics of the branching mechanism as revealed by a study of the upper pressure limit of ignition.

(111) Monocrystalline Nickel Films

1972 ◽  
Vol 30 ◽  
pp. 512-513
Author(s):  
T.E. Pratt ◽  
R.W. Vook
Keyword(s):  
Film Thickness ◽  
Deposition Rate ◽  
Room Temperature ◽  
Narrow Range ◽  
High Vacuum ◽  
Residual Pressure ◽  
Temperature Dependent ◽  
Deposition Parameters ◽  
Transmission Electron ◽  
Substrate Temperatures

(111) oriented thin monocrystalline Ni films have been prepared by vacuum evaporation and examined by transmission electron microscopy and electron diffraction. In high vacuum, at room temperature, a layer of NaCl was first evaporated onto a freshly air-cleaved muscovite substrate clamped to a copper block with attached heater and thermocouple. Then, at various substrate temperatures, with other parameters held within a narrow range, Ni was evaporated from a tungsten filament. It had been shown previously that similar procedures would yield monocrystalline films of CU, Ag, and Au.For the films examined with respect to temperature dependent effects, typical deposition parameters were: Ni film thickness, 500-800 A; Ni deposition rate, 10 A/sec.; residual pressure, 10-6 torr; NaCl film thickness, 250 A; and NaCl deposition rate, 10 A/sec. Some additional evaporations involved higher deposition rates and lower film thicknesses.Monocrystalline films were obtained with substrate temperatures above 500° C. Below 450° C, the films were polycrystalline with a strong (111) preferred orientation.

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