Brookite TiO2 Thin Film Epitaxially Grown on (110) YSZ Substrate by Atomic Layer Deposition

2014 ◽  
Vol 6 (15) ◽  
pp. 11817-11822 ◽  
Author(s):  
Dai-Hong Kim ◽  
Won-Sik Kim ◽  
Sungtae Kim ◽  
Seong-Hyeon Hong
Author(s):  
Yeonchoo Cho ◽  
Sang Hyeon Kim ◽  
Byung Seok Kim ◽  
Youngjin Kim ◽  
Woojin Jeon

This study investigates the chemical reaction mechanism of the ALD to obtain a designated growth behaviour in theoretical and experimental way, hence, provides significant implications for understanding the ALD mechanism based on the DFT calculation.


2018 ◽  
Vol 13 (11) ◽  
pp. 1701-1704 ◽  
Author(s):  
Syed Mansoor Ali ◽  
M. S. Al Garawi ◽  
S. S. Al-Ghamdi ◽  
Muhammad Hammad Aziz ◽  
Turki S. Alkhuraiji ◽  
...  

Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...


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