Atomic-Scale Investigation of Two-Component MoVO Complex Oxide Catalysts Using Aberration-Corrected High-Angle Annular Dark-Field Imaging

2010 ◽  
Vol 22 (6) ◽  
pp. 2033-2040 ◽  
Author(s):  
William D. Pyrz ◽  
Douglas A. Blom ◽  
Masahiro Sadakane ◽  
Katsunori Kodato ◽  
Wataru Ueda ◽  
...  
2010 ◽  
Vol 16 (S2) ◽  
pp. 1184-1185
Author(s):  
W Zhou ◽  
N Soultanidis ◽  
IE Wachs ◽  
MS Wong ◽  
CJ Kiely

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.


2016 ◽  
Vol 169 ◽  
pp. 1-10 ◽  
Author(s):  
Andreas Beyer ◽  
Jürgen Belz ◽  
Nikolai Knaub ◽  
Kakhaber Jandieri ◽  
Kerstin Volz

1999 ◽  
Vol 589 ◽  
Author(s):  
R. Vanfleet ◽  
D.A. Muller ◽  
H.J. Gossmann ◽  
P.H. Citrin ◽  
J. Silcox

AbstractWe report measurements of the distribution of Sb atoms in σ-doped Si, over a wide 2-D concentration range. Both annular dark-field imaging and electron energy loss spectroscopy proved sufficiently sensitive to locate Sb atoms at the atomic scale. Improvements in both detector sensitivities and specimen preparation were necessary to achieve these results, which offer a surprising explanation for the dramatic difference in electrical activity between 2-D and 3-D dopant distributions at the same effective volume concentrations. The prospects for the general identification of individual dopant atoms will be discussed.


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