Electric-Field-Induced Second-Harmonic Generation Demonstrates Different Interface Properties of Molecular Beam Epitaxy Grown MgO on Si

2014 ◽  
Vol 118 (4) ◽  
pp. 1919-1924 ◽  
Author(s):  
Maarten K. Vanbel ◽  
Chen-Yi Su ◽  
Jean-Pierre Locquet ◽  
Thierry Verbiest

The main advantage of molecular beam epitaxy (MBE) is the control and management of the parameters of atomic and molecular fluxes, as well as the characteristics of growing layers during growth. A constructively simple and fairly universal method for diagnosing the struc-tural perfection of semiconductor films during their synthesis in an MBE device for second harmonic generation (SH) using a repetitively pulsed YAG: Nd laser is presented.


1995 ◽  
Vol 336 (1-2) ◽  
pp. 225-231 ◽  
Author(s):  
O.A. Aktsipetrov ◽  
A.V. Melnikov ◽  
T.V. Murzina ◽  
A.A. Nikulin ◽  
A.N. Rubtsov

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