In-situ second-harmonic generation study of the molecular beam epitaxy growth of GaAs

1995 ◽  
Vol 150 ◽  
pp. 92-95
Author(s):  
Takahiro Kimura ◽  
Chikashi Yamada

The main advantage of molecular beam epitaxy (MBE) is the control and management of the parameters of atomic and molecular fluxes, as well as the characteristics of growing layers during growth. A constructively simple and fairly universal method for diagnosing the struc-tural perfection of semiconductor films during their synthesis in an MBE device for second harmonic generation (SH) using a repetitively pulsed YAG: Nd laser is presented.


1989 ◽  
Vol 163 (2-3) ◽  
pp. 123-128 ◽  
Author(s):  
A. Friedrich ◽  
B. Pettinger ◽  
D.M. Kolb ◽  
G. Lüpke ◽  
R. Steinhoff ◽  
...  

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