Lanthanum Oxyfluoride Sol−gel Thin Films by a Simple Single-Source Precursor Route

2008 ◽  
Vol 112 (37) ◽  
pp. 14508-14512 ◽  
Author(s):  
Lidia Armelao ◽  
Gregorio Bottaro ◽  
Giovanni Bruno ◽  
Maria Losurdo ◽  
Michele Pascolini ◽  
...  
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Single Source ◽  
Single Source Precursor ◽  
Precursor Route

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2.

ChemInform ◽  
2003 ◽  
Vol 34 (9) ◽  
Author(s):  
Oh-Shim Joo ◽  
Kwang-Deog Jung ◽  
Sung-Hoon Cho ◽  
Je-Hong Kyoung ◽  
Chang-Kyu Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Single Source ◽  
Single Source Precursor ◽  
New Type

MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications

2007 ◽  
Vol 201 (22-23) ◽  
pp. 9154-9158 ◽  
Author(s):  
M. Lemberger ◽  
S. Thiemann ◽  
A. Baunemann ◽  
H. Parala ◽  
R.A. Fischer ◽  
...  
Keyword(s):  
Thin Films ◽  
Tantalum Nitride ◽  
Single Source ◽  
Metal Electrodes ◽  
Single Source Precursor

Hafnium diboride thin films by chemical vapor deposition from a single source precursor

2005 ◽  
Vol 23 (6) ◽  
pp. 1619-1625 ◽  
Author(s):  
Sreenivas Jayaraman ◽  
Yu Yang ◽  
Do Young Kim ◽  
Gregory S. Girolami ◽  
John R. Abelson
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Hafnium Diboride ◽  
Single Source Precursor

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2

2002 ◽  
Vol 8 (6) ◽  
pp. 273-276 ◽  
Author(s):  
O.-S. Joo ◽  
K.-D. Jung ◽  
S.-H. Cho ◽  
J.-H. Kyoung ◽  
C.-K. Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Single Source ◽  
Single Source Precursor ◽  
New Type
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