MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2.

ChemInform ◽

10.1002/chin.200309021 ◽

2003 ◽

Vol 34 (9) ◽

Author(s):

Oh-Shim Joo ◽

Kwang-Deog Jung ◽

Sung-Hoon Cho ◽

Je-Hong Kyoung ◽

Chang-Kyu Ahn ◽

...

Keyword(s):

Thin Films ◽

Aluminum Nitride ◽

Single Source ◽

Single Source Precursor ◽

New Type

Properties of Hf0.7Zr0.3O2 thin films chemical vapor deposited using a single-source precursor of anhydrous HfxZr1−x(NO34 precursors

2010 International Symposium on Next Generation Electronics ◽

10.1109/isne.2010.5669199 ◽

2010 ◽

Author(s):

Wenqi Zhang ◽

Liuying Huang ◽

Aidong Li ◽

Qiyue Shao ◽

Di Wu

Keyword(s):

Thin Films ◽

Chemical Vapor ◽

Single Source ◽

Chemical Vapor Deposited ◽

Hafnium diboride thin films by chemical vapor deposition from a single source precursor

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2049307 ◽

2005 ◽

Vol 23 (6) ◽

pp. 1619-1625 ◽

Cited By ~ 55

Author(s):

Sreenivas Jayaraman ◽

Yu Yang ◽

Do Young Kim ◽

Gregory S. Girolami ◽

John R. Abelson

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Hafnium Diboride ◽

Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm9905040 ◽

1999 ◽

Vol 11 (12) ◽

pp. 3430-3432 ◽

Cited By ~ 37

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2

10.1002/1521-3862(20021203)8:6<273::aid-cvde273>3.0.co;2-o ◽

2002 ◽

Vol 8 (6) ◽

pp. 273-276 ◽

Cited By ~ 7

Author(s):

O.-S. Joo ◽

K.-D. Jung ◽

S.-H. Cho ◽

J.-H. Kyoung ◽

C.-K. Ahn ◽

...

Keyword(s):

Thin Films ◽

Aluminum Nitride ◽

Single Source ◽

Single Source Precursor ◽

New Type

The X-ray single crystal structure of [Me2In(acac)]2 and its use as a single-source precursor for the deposition of indium oxide thin films

Journal of Materials Chemistry ◽

10.1039/b102212l ◽

2001 ◽

Vol 11 (9) ◽

pp. 2346-2349 ◽

Cited By ~ 19

Author(s):

Jin-Ho Park ◽

Graeme A. Horley ◽

Paul O'Brien ◽

Anthony C. Jones ◽

Majid Motevalli

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Single Crystal ◽

Indium Oxide ◽

Single Crystal Structure ◽

Single Source ◽

Oxide Thin Films ◽

X Ray ◽

CVD of Zr0.65Ti0.35O2 Thin Films Using a Single-Source Precursor of Novel Anhydrous Mixed-Metal Nitrates

10.1002/cvde.200506480 ◽

2006 ◽

Vol 12 (7) ◽

pp. 423-428 ◽

Cited By ~ 9

Author(s):

Q. Shao ◽

A. Li ◽

W. Zhang ◽

D. Wu ◽

Z. Liu ◽

...

Keyword(s):

Thin Films ◽

Single Source ◽

Mixed Metal ◽

Metal Nitrates ◽

The growth of hexagonal boron nitride thin films on silicon using single source precursor

Thin Solid Films ◽

10.1016/s0040-6090(97)01007-9 ◽

1998 ◽

Vol 322 (1-2) ◽

pp. 9-13 ◽

Cited By ~ 23

Author(s):

C Rohr ◽

J.-H Boo ◽

W Ho

Keyword(s):

Thin Films ◽

Boron Nitride ◽

Hexagonal Boron Nitride ◽

Single Source ◽

Solution-processed CdS thin films from a single-source precursor

Journal of Materials Chemistry C ◽

10.1039/c3tc32189d ◽

2014 ◽

Vol 2 (17) ◽

pp. 3247-3253 ◽

Cited By ~ 12

Author(s):

Anthony S. R. Chesman ◽

Noel W. Duffy ◽

Alessandro Martucci ◽

Leonardo De Oliveira Tozi ◽

Th. Birendra Singh ◽

...

Keyword(s):

Thin Films ◽

Single Source ◽

Solution Processed ◽

Single Source Precursor ◽

Cds Thin Films

MOCVD deposition of epitaxial lithium niobate, LiNbO3, thin films using the single source precursor lithium niobium ethoxide, LiNb(OEt)6

Chemistry of Materials ◽

10.1021/cm00032a002 ◽

1993 ◽

Vol 5 (8) ◽

pp. 1056-1058 ◽

Cited By ~ 19

Author(s):

Alex A. Wernberg ◽

Henry J. Gysling

Keyword(s):

Thin Films ◽

Lithium Niobate ◽

Single Source ◽

Single Source Precursor ◽

Niobium Ethoxide