Role of Poly(diallyldimethylammonium chloride) in Selective Polishing of Polysilicon over Silicon Dioxide and Silicon Nitride Films

Naresh K. Penta; P. R. Dandu Veera; S. V. Babu

doi:10.1021/la104257k

Role of Poly(diallyldimethylammonium chloride) in Selective Polishing of Polysilicon over Silicon Dioxide and Silicon Nitride Films

Langmuir ◽

10.1021/la104257k ◽

2011 ◽

Vol 27 (7) ◽

pp. 3502-3510 ◽

Cited By ~ 17

Author(s):

Naresh K. Penta ◽

P. R. Dandu Veera ◽

S. V. Babu

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Silicon Nitride Films ◽

Diallyldimethylammonium Chloride

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The Role of Ce3+ vs. Ce4+ during the Polishing of Silicon Dioxide and Silicon Nitride Films using Ceria Abrasives

Imaging and Applied Optics Technical Papers ◽

10.1364/oft.2012.om2d.1 ◽

2012 ◽

Cited By ~ 1

Author(s):

S. V. Babu ◽

Veera P. Dandu

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Silicon Nitride Films

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Role of hydrogen on the deposition and properties of fluorinated silicon-nitride films prepared by inductively coupled plasma enhanced chemical vapor deposition using SiF4∕N2∕H2 mixtures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1854693 ◽

2005 ◽

Vol 23 (2) ◽

pp. 248-255 ◽

Cited By ~ 7

Author(s):

J. Fandiño ◽

G. Santana ◽

L. Rodríguez-Fernández ◽

J. C. Cheang-Wong ◽

A. Ortiz ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Nitride Films

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Plasma deposition of silicon dioxide and silicon nitride films

Microelectronics Reliability ◽

10.1016/0026-2714(81)90208-0 ◽

1981 ◽

Vol 21 (5) ◽

pp. 763

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Plasma Deposition ◽

Silicon Nitride Films

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Role of Hydrogen in Silicon Nitride Films Prepared by Various Deposition Techniques

MRS Proceedings ◽

10.1557/proc-118-671 ◽

1988 ◽

Vol 118 ◽

Cited By ~ 19

Author(s):

J. Kanicki

Keyword(s):

Silicon Nitride ◽

Silicon Nitride Films ◽

Deposition Techniques

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Role of argon plasma on the structural and morphological properties of silicon nitride films by pulsed DC glow discharge

2013 International Conference on Aerospace Science & Engineering (ICASE) ◽

10.1109/icase.2013.6785561 ◽

2013 ◽

Author(s):

K. Abbas ◽

R. Ahmad ◽

I. A. Khan ◽

U. Ikhlaq ◽

S. Saleem ◽

...

Keyword(s):

Silicon Nitride ◽

Glow Discharge ◽

Argon Plasma ◽

Morphological Properties ◽

Dc Glow Discharge ◽

Silicon Nitride Films ◽

Pulsed Dc

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Role of low-energy secondary electrons in synchrotron radiation-excited chemical vapor deposition of silicon nitride films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580936 ◽

1997 ◽

Vol 15 (5) ◽

pp. 2644-2652 ◽

Cited By ~ 2

Author(s):

Hakaru Kyuragi

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Synchrotron Radiation ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Energy ◽

Secondary Electrons ◽

Silicon Nitride Films

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Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Applied Surface Science ◽

10.1016/j.apsusc.2013.07.057 ◽

2013 ◽

Vol 283 ◽

pp. 986-992 ◽

Cited By ~ 12

Author(s):

Naresh K. Penta ◽

H.P. Amanapu ◽

B.C. Peethala ◽

S.V. Babu

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Colloidal Silica ◽

Anionic Surfactants ◽

Silicon Nitride Films

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Selective Polishing of Amorphous Silicon Carbonitride (a-SiCN) Films Over Silicon Dioxide and Silicon Nitride Films for Hardmask Applications

ECS Journal of Solid State Science and Technology ◽

10.1149/2162-8777/ab7b45 ◽

2020 ◽

Vol 9 (3) ◽

pp. 034004

Author(s):

Akshay Gowda ◽

Sridevi Alety ◽

Charith K. Ranaweera ◽

S.V. Babu

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Amorphous Silicon ◽

Silicon Carbonitride ◽

Silicon Nitride Films

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Role of incorporated hydrogen in non-stoichiometric photo-deposited silicon nitride films

Thin Solid Films ◽

10.1016/s0040-6090(02)00542-4 ◽

2002 ◽

Vol 415 (1-2) ◽

pp. 53-56 ◽

Cited By ~ 7

Author(s):

B.S Sahu ◽

P Srivastava ◽

H.K Sehgal ◽

O.P Agnihotri

Keyword(s):

Silicon Nitride ◽

Silicon Nitride Films

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Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1626642 ◽

2004 ◽

Vol 22 (1) ◽

pp. 53-60 ◽

Cited By ~ 167

Author(s):

T. E. F. M. Standaert ◽

C. Hedlund ◽

E. A. Joseph ◽

G. S. Oehrlein ◽

T. J. Dalton

Keyword(s):

Silicon Carbide ◽

Silicon Nitride ◽

Silicon Dioxide ◽

Film Formation ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon ◽

Silicon Silicon ◽

Fluorocarbon Film

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