The Role of Ce3+ vs. Ce4+ during the Polishing of Silicon Dioxide and Silicon Nitride Films using Ceria Abrasives
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2005 ◽
Vol 23
(2)
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pp. 248-255
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1997 ◽
Vol 15
(5)
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pp. 2644-2652
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2013 ◽
Vol 283
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pp. 986-992
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2020 ◽
Vol 9
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pp. 034004
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2004 ◽
Vol 22
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pp. 53-60
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