Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
2006 ◽
Vol 45
(8A)
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pp. 6342-6345
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Keyword(s):
2013 ◽
Vol 1
(39)
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pp. 6188
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Keyword(s):
Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor
1991 ◽
Vol 138
(11)
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pp. 3499-3504
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Keyword(s):
Keyword(s):
1994 ◽
Vol 12
(4)
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pp. 1108-1113
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Keyword(s):
2004 ◽
Vol 109
(1-3)
◽
pp. 17-23
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2018 ◽
Vol 8
(4)
◽
pp. 982-989
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