Photo-Kelvin probe force microscopy for photocatalytic performance characterization of single filament of TiO2 nanofiber photocatalysts

2013 ◽  
Vol 1 (18) ◽  
pp. 5715 ◽  
Author(s):  
Ming-Chung Wu ◽  
Hseuh-Chung Liao ◽  
Yu-Cheng Cho ◽  
Géza Tóth ◽  
Yang-Fang Chen ◽  
...  
Keyword(s):  
Photocatalytic Performance ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Single Filament ◽  
Performance Characterization ◽  
Force Microscopy ◽  
Tio2 Nanofiber

Nanoscale characterization of copper oxide films by Kelvin Probe Force Microscopy

2015 ◽  
Vol 584 ◽  
pp. 310-315 ◽  
Author(s):  
Tobias Berthold ◽  
Guenther Benstetter ◽  
Werner Frammelsberger ◽  
Rosana Rodríguez ◽  
Montserrat Nafría
Keyword(s):  
Copper Oxide ◽  
Oxide Films ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Force Microscopy ◽  
Nanoscale Characterization

Characterization of graphene layers by Kelvin probe force microscopy and micro-Raman spectroscopy

2013 ◽  
Vol 10 (7-8) ◽  
pp. 1172-1175 ◽  
Author(s):  
A. N. Nazarov ◽  
S. O. Gordienko ◽  
P. M. Lytvyn ◽  
V. V. Strelchuk ◽  
A. S. Nikolenko ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Graphene Layers ◽  
Force Microscopy ◽  
Micro Raman Spectroscopy

Mechanical Stress Characterization of Shallow Trench Isolation by Kelvin Probe Force Microscopy

1999 ◽  
Vol 568 ◽  
Author(s):  
Hernan Rueda ◽  
James Slinkman ◽  
Dureseti Chidambarrao ◽  
Leon Moszkowicz ◽  
Phil Kaszuba ◽  
...  
Keyword(s):  
Finite Element ◽  
Work Function ◽  
Mechanical Stress ◽  
Mechanical Strain ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Shallow Trench Isolation ◽  
Force Microscopy ◽  
Trench Isolation

ABSTRACTmethod for characterizing the mechanical stress induced in silicon technology is described. Analysis by scanning Kelvin probe force microscopy (SKPM) coupled with finite-element (FE) mechanical strain simulations is performed. The SKPM technique detects variations in the semiconductor work function due to strain influences on the band gap. This technique is then used to analyze the strain induced by shallow trench isolation processes for electrical isolation. The SKPM measurements agree with the FE simulations qualitatively.

Characterization of electrical surface properties of mono- and co-cultures of Pseudomonas aeruginosa and methicillin-resistant Staphylococcus aureus using Kelvin probe force microscopy

RSC Advances ◽  
2014 ◽  
Vol 4 (80) ◽  
pp. 42432-42440 ◽  
Author(s):  
Eric Birkenhauer ◽  
Suresh Neethirajan
Keyword(s):  
Staphylococcus Aureus ◽  
Pseudomonas Aeruginosa ◽  
Surface Properties ◽  
Methicillin Resistant Staphylococcus Aureus ◽  
Kelvin Probe Force Microscopy ◽  
Bacterial Cells ◽  
Kelvin Probe ◽  
Potential Measurement ◽  
Force Microscopy

Quantitative nanoscale surface potential measurement of individual pathogenic bacterial cells for understanding the adhesion kinetics using Kelvin probe force microscopy.

Characterization of quantum wells by cross-sectional Kelvin probe force microscopy

2004 ◽  
Vol 85 (22) ◽  
pp. 5245-5247 ◽  
Author(s):  
O. Douhéret ◽  
S. Anand ◽  
Th. Glatzel ◽  
K. Maknys ◽  
S. Sadewasser
Keyword(s):  
Quantum Wells ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Cross Sectional ◽  
Force Microscopy
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