Characterization of graphene layers by Kelvin probe force microscopy and micro-Raman spectroscopy

2013 ◽  
Vol 10 (7-8) ◽  
pp. 1172-1175 ◽  
Author(s):  
A. N. Nazarov ◽  
S. O. Gordienko ◽  
P. M. Lytvyn ◽  
V. V. Strelchuk ◽  
A. S. Nikolenko ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Graphene Layers ◽  
Force Microscopy ◽  
Micro Raman Spectroscopy

Electronic characterization of single-layer MoS2 sheets exfoliated on SrTiO3

2012 ◽  
Vol 1474 ◽  
Author(s):  
Benedict Kleine Bußmann ◽  
Kolyo Marinov ◽  
Oliver Ochedowski ◽  
Nils Scheuschner ◽  
Janina Maultzsch ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Single Layer ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Direct Bandgap ◽  
Force Microscopy ◽  
Dipole Layer ◽  
Good Agreement

ABSTRACTSingle layer regions of MoS2 on SiO2 and SrTiO3 were identified by Raman spectroscopy and μ-photoluminescence before Kelvin probe force microscopy was performed. For the already known system MoS2/SiO2 we find 1.839 eV for the direct bandgap, in good agreement with earlier results. On MoS2/SrTiO3 the direct bandgap was determined to be 1.829 eV. From our Kelvin probe data we infer that the SrTiO3 substrate leads to a dipole layer at the interface of the MoS2 single layer. The corresponding μ-PL measurements however show no significant decrease of the bandgap. This shows, that in the case of MoS2 the carrier type as well as concentration is not significantly influenced by the choice of SrTiO3 as the substrate compared to SiO2.

Nanoscale characterization of copper oxide films by Kelvin Probe Force Microscopy

2015 ◽  
Vol 584 ◽  
pp. 310-315 ◽  
Author(s):  
Tobias Berthold ◽  
Guenther Benstetter ◽  
Werner Frammelsberger ◽  
Rosana Rodríguez ◽  
Montserrat Nafría
Keyword(s):  
Copper Oxide ◽  
Oxide Films ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Force Microscopy ◽  
Nanoscale Characterization

Mechanical Stress Characterization of Shallow Trench Isolation by Kelvin Probe Force Microscopy

1999 ◽  
Vol 568 ◽  
Author(s):  
Hernan Rueda ◽  
James Slinkman ◽  
Dureseti Chidambarrao ◽  
Leon Moszkowicz ◽  
Phil Kaszuba ◽  
...  
Keyword(s):  
Finite Element ◽  
Work Function ◽  
Mechanical Stress ◽  
Mechanical Strain ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Shallow Trench Isolation ◽  
Force Microscopy ◽  
Trench Isolation

ABSTRACTmethod for characterizing the mechanical stress induced in silicon technology is described. Analysis by scanning Kelvin probe force microscopy (SKPM) coupled with finite-element (FE) mechanical strain simulations is performed. The SKPM technique detects variations in the semiconductor work function due to strain influences on the band gap. This technique is then used to analyze the strain induced by shallow trench isolation processes for electrical isolation. The SKPM measurements agree with the FE simulations qualitatively.

Raman Spectroscopy and Kelvin Probe Force Microscopy characteristics of the CVD suspended graphene

2016 ◽  
Vol 64 ◽  
pp. 27-33 ◽  
Author(s):  
Krzysztof Gajewski ◽  
Stefan Goniszewski ◽  
Anna Szumska ◽  
Magdalena Moczaɫa ◽  
Piotr Kunicki ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Suspended Graphene ◽  
Force Microscopy

Characterization of electrical surface properties of mono- and co-cultures of Pseudomonas aeruginosa and methicillin-resistant Staphylococcus aureus using Kelvin probe force microscopy

RSC Advances ◽  
2014 ◽  
Vol 4 (80) ◽  
pp. 42432-42440 ◽  
Author(s):  
Eric Birkenhauer ◽  
Suresh Neethirajan
Keyword(s):  
Staphylococcus Aureus ◽  
Pseudomonas Aeruginosa ◽  
Surface Properties ◽  
Methicillin Resistant Staphylococcus Aureus ◽  
Kelvin Probe Force Microscopy ◽  
Bacterial Cells ◽  
Kelvin Probe ◽  
Potential Measurement ◽  
Force Microscopy

Quantitative nanoscale surface potential measurement of individual pathogenic bacterial cells for understanding the adhesion kinetics using Kelvin probe force microscopy.

Characterization of quantum wells by cross-sectional Kelvin probe force microscopy

2004 ◽  
Vol 85 (22) ◽  
pp. 5245-5247 ◽  
Author(s):  
O. Douhéret ◽  
S. Anand ◽  
Th. Glatzel ◽  
K. Maknys ◽  
S. Sadewasser
Keyword(s):  
Quantum Wells ◽  
Kelvin Probe Force Microscopy ◽  
Kelvin Probe ◽  
Cross Sectional ◽  
Force Microscopy
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