Chemical modification of polysiloxanes with polar pendant groups by co-hydrosilylation

RSC Advances ◽  
2014 ◽  
Vol 4 (71) ◽  
pp. 37620-37628 ◽  
Author(s):  
Carmen Racles ◽  
Mihaela Alexandru ◽  
Adrian Bele ◽  
Valentina E. Musteata ◽  
Maria Cazacu ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Permittivity ◽  
Chemical Modification ◽  
Dielectric Elastomer ◽  
Active Components

Polysiloxanes were modified by (co-)hydrosilylation with γ-cyanopropyl and hexyl groups, to finely tune their composition and properties, especially dielectric permittivity, as a way towards active components in dielectric elastomer transducers. Un-modified Si–H groups can be further used to obtain cross-linked thin films.

Measuring Fatigue in PZT Thin Films

1990 ◽  
Vol 200 ◽  
Author(s):  
D. J. Johnson ◽  
D. T. Amm ◽  
E. Griswold ◽  
K. Sreenivas ◽  
G. Yi ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dielectric Permittivity ◽  
Dielectric Response ◽  
Remanent Polarization ◽  
Small Signal ◽  
Large Signal ◽  
Pzt Thin Films ◽  
Pzt Thin Film

ABSTRACTSmall signal dielectric response is reported for a variety of PZT thin film samples. Small and large signal responses, recorded simultaneously during the fatiguing of PZT thin films, are used to identify distinct fatigue mechanisms. Microcracking or electrode delamination less than 100 Å is sufficient to explain the high correlation between the dielectric permittivity and remanent polarization during fatigue.

scholarly journals Comparison of Fabrication Methods of Metal-Organic Framework Optical Thin Films

Nanomaterials ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 676 ◽  
Author(s):  
Yan Huang ◽  
Cheng-an Tao ◽  
Rui Chen ◽  
Liping Sheng ◽  
Jianfang Wang
Keyword(s):  
Thin Films ◽  
Self Assembly ◽  
Metal Organic Framework ◽  
Dip Coating ◽  
Layer Growth ◽  
Layer By Layer ◽  
Active Components ◽  
Growth Method ◽  
Metal Organic ◽  
University Of Oslo

Homogeneous metal-organic frameworks (MOFs)-based optical thin films have attracted increasing attention, since they can potentially be used as active components in optical/opt-electrical devices, and how to fabricate MOF thin films with high quality is the premise of practically using them. Herein, five fabrication methods of MOF films are systematically investigated and compared from the aspects of appearance, reflectivity, micro-morphology, surface roughness, and optical properties of the films. The famous robust Zr-based MOF, UiO-66 (UiO = University of Oslo) is chosen as a model, and the five methods are spin-coating, dip-coating, self-assembly, direct growth, and the stepwise layer by layer growth method. This study provides fundamental support for the application of MOFs in the optical field.

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