scholarly journals Characterization of nitrogen species incorporated into graphite using low energy nitrogen ion sputtering

2016 ◽  
Vol 18 (1) ◽  
pp. 458-465 ◽  
Author(s):  
Hisao Kiuchi ◽  
Takahiro Kondo ◽  
Masataka Sakurai ◽  
Donghui Guo ◽  
Junji Nakamura ◽  
...  

The well-controlled nitrogen doped graphite with graphitic nitrogen located in the zigzag edge and/or vacancy sites can be realized using the low energy nitrogen sputtering. The doping mechanism of nitrogen ions is also discussed.

Author(s):  
C. Ballesteros ◽  
J. A. Garci´a ◽  
M. I. Orti´z ◽  
R. Rodri´guez ◽  
M. Varela

A detailed tribological characterization of low-energy, nitrogen implanted V5 at. %Ti alloy is presented. Samples were nitrogen-implanted at an accelerating voltage of 1.2 kV and 1 mA/cm2, up to a dose of 1E19 ions/cm2. The tribological properties of the alloys: microhardness, friction coefficient and wear resistance, have improved after ion implantation and this improvement increases as the implantation temperature increases. The microstructure of the alloys were analysed by transmission electron microscopy. A direct correlation between structural modifications of the nitrogen implanted layer and the improvement in their tribological properties is obtained. For samples implanted at 848 K a nanocomposite layer where the reinforcement particles are TiN precipitates forms. TiN precipitation appears as the responsible of the improvement in the tribological properties.


Author(s):  
Takayuki Shima ◽  
Yunosuke Makita ◽  
Shinji Kimura ◽  
Tsutomu Iida ◽  
Hirokazu Sanpei ◽  
...  

RSC Advances ◽  
2014 ◽  
Vol 4 (52) ◽  
pp. 27308-27314 ◽  
Author(s):  
Shibin Krishna TC ◽  
Govind Gupta

InN/GaN heterostructure based Schottky diodes are fabricated by low energetic nitrogen ions at 300 °C.


2018 ◽  
Vol 448 ◽  
pp. 628-635 ◽  
Author(s):  
Luca Tortora ◽  
Marco Urbini ◽  
Andrea Fabbri ◽  
Paolo Branchini ◽  
Luigi Mariucci ◽  
...  

1999 ◽  
Vol 585 ◽  
Author(s):  
J. W. Gerlach ◽  
D. Schrupp ◽  
R. Schwertberger ◽  
B. Rauschenbach ◽  
A. Anders

AbstractThe deposition of thin epitaxial hexagonal gallium nitride films on c-plane sapphire by low-energy nitrogen ion assisted deposition is shown to result in films of high crystalline quality. The quality can be further heightened by using the concept of an isothermal growth rate ramp. Characterization of film structure, defect density distribution and surface topography by XRD, RBS/C, and AFM, respectively, reveals the importance of the nitrogen ion energy and the ion to atom ratio on the film properties.


1983 ◽  
Vol 27 ◽  
Author(s):  
R. Martinella ◽  
G. Chevallard ◽  
C. Tosello

ABSTRACTMechanically polished Ti6Al4V samples were implanted with 100 key nitrogen ions to a fluence of 5.1017 ions/cm2 at two different bulk tenneratures: 370°C and 470°C. Wear tests were carried out with a reciprocating slidina tribotester. Structural modifications and wear morphologies were studied by TEM and SEM. 370°C implanted sample showed the same wear behavior as unimplanted ones, while 470°C implanted sample showed better wear resistance because of a TiN hardened layer. Correlations- between microstructural modifications, wear behavior and mechanisms are reported: results agree with the delamination theory. Comparison with ion- and gas-nitrided samples are presented.


2015 ◽  
Vol 106 (25) ◽  
pp. 253105 ◽  
Author(s):  
Wei Cai ◽  
Cong Wang ◽  
Xiaohong Fang ◽  
Liyou Yang ◽  
Xiaoyuan Chen

2004 ◽  
Vol 70 (14) ◽  
Author(s):  
H. Hiraka ◽  
P. Böni ◽  
K. Yamada ◽  
S. Park ◽  
S-. H. Lee ◽  
...  

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