scholarly journals Flipping growth orientation of nanographitic structures by plasma enhanced chemical vapor deposition

RSC Advances ◽  
2015 ◽  
Vol 5 (111) ◽  
pp. 91922-91931 ◽  
Author(s):  
Subrata Ghosh ◽  
K. Ganesan ◽  
S. R. Polaki ◽  
S. Ilango ◽  
S. Amirthapandian ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Electron Cyclotron ◽  
Morphological Features ◽  
Growth Orientation ◽  
Si Substrates ◽  
Resonance Plasma

Nanographitic structures (NGSs) with a multitude of morphological features are grown on SiO2/Si substrates by electron cyclotron resonance-plasma enhanced chemical vapor deposition (ECR-PECVD).

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