Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes
Keyword(s):
Directed self-assembly of block copolymers on chemical patterns with sidewall guiding lines is examined as a function of backfill brush properties, block copolymer film thickness, pattern size, and sidewall interaction strength.
2020 ◽
Vol 58
(16)
◽
pp. 2159-2167
◽
2019 ◽
Vol 7
(1)
◽
pp. 1901605
◽
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