scholarly journals An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor

2016 ◽  
Vol 4 (5) ◽  
pp. 1057-1065 ◽  
Author(s):  
M. Gebhard ◽  
F. Mitschker ◽  
M. Wiesing ◽  
I. Giner ◽  
B. Torun ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Low Temperature ◽  
Tio2 Thin Films ◽  
Gas Barrier ◽  
Polymer Substrates ◽  
Barrier Layers ◽  
Titanium Dioxide Thin Films

A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.

scholarly journals Comparison of the heat-treatment effect on carrier dynamics in TiO2 thin films deposited by different methods

2021 ◽  
Author(s):  
Ramsha Khan ◽  
Harri Ali-Löytty ◽  
Antti Tukiainen ◽  
Nikolai V Tkachenko
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Titanium Dioxide ◽  
Charge Carrier ◽  
Carrier Lifetime ◽  
Carrier Dynamics ◽  
Fabrication Method ◽  
Tio2 Thin Films ◽  
Titanium Dioxide Thin Films ◽  
Charge Carrier Lifetime

Polycrystalline titanium dioxide thin films are routinely used in a broad range of applications where charge carrier lifetime is essential to the performance but the effects of fabrication method are...

scholarly journals TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD

2019 ◽  
Vol 491 ◽  
pp. 116-122 ◽  
Author(s):  
D. Li ◽  
N. Gautier ◽  
B. Dey ◽  
S. Bulou ◽  
M. Richard-Plouet ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Tio2 Thin Films ◽  
Tem Analysis ◽  
Polymer Substrates ◽  
Photocatalytic Tio2

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

2005 ◽  
Vol 200 (1-4) ◽  
pp. 967-971 ◽  
Author(s):  
D. Glöß ◽  
P. Frach ◽  
O. Zywitzki ◽  
T. Modes ◽  
S. Klinkenberg ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Pulse Magnetron ◽  
Titanium Dioxide Thin Films ◽  
Reactive Pulse

Diffusion of silicon in titanium dioxide thin films with different degree of crystallinity: Efficiency of TiO2 and TiN barrier layers

Vacuum ◽  
2016 ◽  
Vol 128 ◽  
pp. 178-185 ◽  
Author(s):  
J. Libardi ◽  
K.G. Grigorov ◽  
M. Massi ◽  
A.S. da Silva Sobrinho ◽  
R.S. Pessoa ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Degree Of Crystallinity ◽  
Barrier Layers ◽  
Titanium Dioxide Thin Films

Surface Morphology and Structure Study of Titanium Dioxide Thin Films Deposited on PET Substrates

2009 ◽  
Vol 79-82 ◽  
pp. 883-886
Author(s):  
Yu Hui Zhang ◽  
Quan Ji ◽  
Xi Hua Pei
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Surface Morphology ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Structure Study ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Titanium Dioxide Thin Films ◽  
Pet Substrate

Titanium dioxide (TiO2) thin films were deposited by rf magnetron sputtering, using a Ti target (purity 99.99%), on poly (ethylene terephthalate) (PET) substrate. Argon and oxygen were used as the working and reacting gas, respectively. The surface morphology was studied using scanning electron microscopy (SEM) and atomic force microscopy (AFM), and the film composition and structure by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). Uniform and compact TiO2 nanoparticles with diameter about 50 nm were deposited on PET substrates within 2 minutes. Many nano-sized particles aggregated and formed larger clusters after 5 minutes. The size of the clusters increased with increased sputtering time. The particles grew perpendicular to the substrate, and the surfaces of the films were smooth and undulate. The Ti2p peak was resolvable into the three valence species Ti4+, Ti3+ and Ti2+. The O/Ti ratio varied with the Ar: O2, ratio, the optimum value of which was in the range 4-8. The TiO2 films deposited on PET substrate were amorphous.

Low temperature Au induced crystallization of titanium dioxide thin films for resistive switching applications

RSC Advances ◽  
2015 ◽  
Vol 5 (83) ◽  
pp. 67493-67499 ◽  
Author(s):  
L. D. Varma Sangani ◽  
K. Vijaya Sri ◽  
Md. Ahamad Mohiddon ◽  
M. Ghanashyam Krishna
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Low Temperature ◽  
Resistive Switching ◽  
Crystallization Temperature ◽  
Titanium Dioxide Thin Films ◽  
Induced Crystallization

Au induced decrease of TiO2 crystallization temperature.

scholarly journals Structure and optical properties of TiO2 thin films deposited by ALD method

Open Physics ◽  
2017 ◽  
Vol 15 (1) ◽  
pp. 1067-1071 ◽  
Author(s):  
Marek Szindler ◽  
Magdalena M. Szindler ◽  
Paulina Boryło ◽  
Tymoteusz Jung
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Energy Dispersive Spectrometer ◽  
Atomic Layer ◽  
Tio2 Thin Films ◽  
X Ray Crystallography ◽  
Systems Software ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method ◽  
Titanium Dioxide Thin Films

AbstractThis paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.

Optical constants of DC magnetron sputtered titanium dioxide thin films measured by spectroscopic ellipsometry

2003 ◽  
Vol 38 (9) ◽  
pp. 773-778 ◽  
Author(s):  
B. Karunagaran ◽  
R. T. Rajendra Kumar ◽  
C. Viswanathan ◽  
D. Mangalaraj ◽  
Sa. K. Narayandass ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants ◽  
Titanium Dioxide Thin Films
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