Electric field directed self-assembly of block copolymers for rapid formation of large-area complex nanopatterns

2017 ◽  
Vol 2 (5) ◽  
pp. 560-566 ◽  
Author(s):  
Hyun Uk Jeon ◽  
Hyeong Min Jin ◽  
Ju Young Kim ◽  
Seung Keun Cha ◽  
Jeong Ho Mun ◽  
...  

We investigate the unusually rapid directed self-assembly of block copolymer (BCP) thin films by imposing an in-plane electric field.

RSC Advances ◽  
2014 ◽  
Vol 4 (32) ◽  
pp. 16721-16725 ◽  
Author(s):  
Gianpaolo Chieffi ◽  
Rocco Di Girolamo ◽  
Antonio Aronne ◽  
Pasquale Pernice ◽  
Esther Fanelli ◽  
...  

A fast method for the preparation of block-copolymer-based hybrid composite nanostructures and titania substrates well oriented over a large area, is illustrated.


RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44218-44221 ◽  
Author(s):  
Elio Poggi ◽  
Jean-Pierre Bourgeois ◽  
Bruno Ernould ◽  
Jean-François Gohy

We report a novel approach to synthesize well-defined polymeric Janus nanoparticles by combining the self-assembly of block copolymers in thin films and surface modification by polymer grafting.


Small ◽  
2015 ◽  
Vol 11 (48) ◽  
pp. 6376-6376 ◽  
Author(s):  
Yecheol Rho ◽  
Karim Aissou ◽  
Muhammad Mumtaz ◽  
Wonsang Kwon ◽  
Gilles Pécastaings ◽  
...  

2009 ◽  
Vol 1203 ◽  
Author(s):  
Muruganathan Ramanathan ◽  
Seth B. Darling ◽  
Anirudha V. Sumant ◽  
Orlando Auciello

AbstractBlock copolymers (BCPs) consist of two or more chemically distinct and incompatible polymer chains (or blocks) covalently bonded. Due to the incompatibility and connectivity constraints between the two blocks, diblock copolymers spontaneously self-assemble into microphase-separated nanoscale domains that exhibit ordered 0, 1, 2 or 3 dimensional morphologies at equilibrium. Commonly observed microdomain morphologies in bulk samples are periodic arrangements of lamellae, cylinders, or spheres. Block copolymer lithography refers to the use of these ordered structures in the form of thin films as templates for patterning through selective etching or deposition. The self-assembly and domain orientation of block copolymers on a given substrate is critical to realize block copolymer lithography as a tool for large throughput nanolithography applications. In this work, we survey the morphology of cylinder-forming block copolymers by atomic force microscopy (AFM). Three kind of block copolymers were studied: a) poly(styrene-block-ferrocenyldimethylsilane), PS-b-PFS b) poly(styrene-block-methylmethacrylate), PS-b-PMMA and c) poly(styrene-block-dimethylsiloxane) PS-b-PDMS. Block copolymers were dissolved in a neutral solvent for both blocks (toluene) in order to obtain solutions of various concentrations (1 and 1.5 wt %). From these solutions, films were prepared by spin casting on ultrananocrystalline diamond (UNCD) thin film substrates. Results indicate that PS-b-PFS exhibits chemical and morphological compatibility to the UNCD surface in terms of wetting and domain control. A systematic comparison of self-assembly of these polymers on silicon nitride substrates demonstrates that UNCD thin films would require pre-treatment to be considered as a substrate for BCP lithography.


2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim

Langmuir ◽  
2014 ◽  
Vol 30 (35) ◽  
pp. 10728-10739 ◽  
Author(s):  
Parvaneh Mokarian-Tabari ◽  
Cian Cummins ◽  
Sozaraj Rasappa ◽  
Claudia Simao ◽  
Clivia M. Sotomayor Torres ◽  
...  

2020 ◽  
Vol 1000 ◽  
pp. 324-330
Author(s):  
Sri Agustina ◽  
Masayoshi Tokuda ◽  
Hideto Minami ◽  
Cyrille Boyer ◽  
Per B. Zetterlund

The self-assembly of block copolymers has attracted attention for many decades because it can yield polymeric nanoobjects with a wide range of morphologies. Membrane emulsification is a fairly novel technique for preparation of various types of emulsions, which relies on the dispersed phase passing through a membrane in order to effect droplet formation. In this study, we have prepared polymeric nanoparticles of different morphologies using self-assembly of asymmetric block copolymers in connection with membrane emulsification. Shirasu Porous Glass (SPG) membranes has been employed as the membrane emulsification equipment, and poly (oligoethylene glycol acrylate)-block-poly (styrene) (POEGA-b-PSt) copolymers prepared via RAFT polymerization. It has been found that a number of different morphologies can be achieved using this novel technique, including spheres, rods, and vesicles. Interestingly, the results have shown that the morphology can be controlled not only by adjusting experimental parameters specific to the membrane emulsification step such as membrane pore size and pressure, but also by changing the nature of organic solvent. As such, this method provides a novel route to these interesting nanoobjects, with interesting prospects in terms of exercising morphology control without altering the nature of the block copolymer itself.


2018 ◽  
Vol 51 (19) ◽  
pp. 7881-7892
Author(s):  
Bin Zheng ◽  
Xingkun Man ◽  
Zhong-Can Ou-Yang ◽  
M. Schick ◽  
David Andelman

Polymers ◽  
2020 ◽  
Vol 12 (4) ◽  
pp. 781 ◽  
Author(s):  
Sedakat Altinpinar ◽  
Wael Ali ◽  
Patrick Schuchardt ◽  
Pinar Yildiz ◽  
Hui Zhao ◽  
...  

On the basis of the major application for block copolymers to use them as separation membranes, lithographic mask, and as templates, the preparation of highly oriented nanoporous thin films requires the selective removal of the minor phase from the pores. In the scope of this study, thin film of polystyrene-block-poly(ethylene oxide) block copolymer with a photocleavable junction groups based on ortho-nitrobenzylester (ONB) (PS-hν-PEO) was papered via the spin coating technique followed by solvent annealing to obtain highly-ordered cylindrical domains. The polymer blocks are cleaved by means of a mild UV exposure and then the pore material is washed out of the polymer film by ultra-pure water resulting in arrays of nanoporous thin films to remove one block. The removal of the PEO materials from the pores was proven using the grazing-incidence small-angle X-ray scattering (GISAXS) technique. The treatment of the polymer film during the washing process was observed in real time after two different UV exposure time (1 and 4 h) in order to draw conclusions regarding the dynamics of the removal process. In-situ X-ray reflectivity measurements provide statistically significant information about the change in the layer thickness as well as the roughness and electron density of the polymer film during pore formation. 4 H UV exposure was found to be more efficient for PEO cleavage. By in-situ SFM measurements, the structure of the ultra-thin block copolymer films was also analysed and, thus, the kinetics of the washing process was elaborated. The results from both measurements confirmed that the washing procedure induces irreversible change in morphology to the surface of the thin film.


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