scholarly journals Metal–insulator–semiconductor field-effect transistors (MISFETs) using p-type SnS and nanometer-thick Al2S3 layers

RSC Advances ◽  
2017 ◽  
Vol 7 (18) ◽  
pp. 11111-11117 ◽  
Author(s):  
Devika Mudusu ◽  
Koteeswara Reddy Nandanapalli ◽  
Sreekantha Reddy Dugasani ◽  
Ramesh Karuppannan ◽  
Gunasekhar Kothakota Ramakrishna Reddy ◽  
...  

SnS based MISFET devices exhibit a high turn-on voltage of +5.13 V and rectification factor of 1383@+6 V.

2005 ◽  
Vol 14 (3-7) ◽  
pp. 509-513 ◽  
Author(s):  
Nobuyuki Kawakami ◽  
Yoshihiro Yokota ◽  
Kazushi Hayashi ◽  
Takeshi Tachibana ◽  
Koji Kobashi

2010 ◽  
Vol 97 (25) ◽  
pp. 253502 ◽  
Author(s):  
Yuji Urabe ◽  
Masafumi Yokoyama ◽  
Hideki Takagi ◽  
Tetsuji Yasuda ◽  
Noriyuki Miyata ◽  
...  

1982 ◽  
Vol 92 (3) ◽  
pp. 295-301
Author(s):  
A.L. Dawar ◽  
O.P. Taneja ◽  
S.K. Paradkar ◽  
Partap Kumar ◽  
P.C. Mathur

2019 ◽  
Vol 7 (29) ◽  
pp. 8855-8860 ◽  
Author(s):  
Janghyuk Kim ◽  
Marko J. Tadjer ◽  
Michael A. Mastro ◽  
Jihyun Kim

The threshold voltage of β-Ga2O3 metal–insulator–semiconductor field-effect transistors is controlled via remote fluorine plasma treatment, enabling an enhancement-mode operation under double gate condition.


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