High-performance thin H:SiON OLED encapsulation layer deposited by PECVD at low temperature
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High-performance H:SiON single layer thin film encapsulation (TFE) was deposited by plasma enhanced chemical vapor deposition (PECVD) method. To control the characteristics of the SiON thin films, hydrogen gas was introduced during PECVD process.
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1990 ◽
pp. 217-222
1992 ◽
Vol 139
(4)
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pp. 1151-1159
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1989 ◽
Vol 24
(2)
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pp. 213-219
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2013 ◽
Vol 38
(32)
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pp. 14085-14101
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1998 ◽
Vol 21
(1-4)
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pp. 355-366
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