scholarly journals Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films

RSC Advances ◽  
2020 ◽  
Vol 10 (46) ◽  
pp. 27357-27368 ◽  
Author(s):  
Saidjafarzoda Ilhom ◽  
Adnan Mohammad ◽  
Deepa Shukla ◽  
John Grasso ◽  
Brian G. Willis ◽  
...  
Keyword(s):  
Thin Films ◽  
Indium Nitride ◽  
Atomic Layer ◽  
Nitrogen Plasma ◽  
Plasma Composition ◽  
Cathode Plasma ◽  
Layer Deposition ◽  
Hydrogen Radicals ◽  
Crystal Phase Transformation

Hollow-cathode plasma-generated hydrogen radicals induce crystal phase transformation from h-InN to c-In2O3 during plasma-enhanced atomic layer deposition using trimethyl-indium and Ar/N2 plasma.

scholarly journals Role of oligomer structures in the surface chemistry of amidinate metal complexes used for atomic layer deposition of thin films

2019 ◽  
Vol 35 (7) ◽  
pp. 720-731 ◽  
Author(s):  
Jonathan Guerrero-Sánchez ◽  
Bo Chen ◽  
Noboru Takeuchi ◽  
Francisco Zaera
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Chemistry ◽  
Metal Complexes ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Image Position

Abstract

scholarly journals Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

2020 ◽  
Vol 38 (2) ◽  
pp. 022405 ◽  
Author(s):  
Saidjafarzoda Ilhom ◽  
Deepa Shukla ◽  
Adnan Mohammad ◽  
John Grasso ◽  
Brian Willis ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Rf Power ◽  
Cathode Plasma ◽  
Film Properties ◽  
Layer Deposition ◽  
Aln Film

scholarly journals Low-temperature grown wurtzite InxGa1−xN thin films via hollow cathode plasma-assisted atomic layer deposition

2015 ◽  
Vol 3 (37) ◽  
pp. 9620-9630 ◽  
Author(s):  
Ali Haider ◽  
Seda Kizir ◽  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Shahid Ali Leghari ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Band Gap ◽  
Hollow Cathode ◽  
Optical Band Gap ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition ◽  
Wide Range

Hollow cathode plasma assisted atomic layer deposited InxGa1−xN alloys show successful tunability of the optical band gap by changing the In concentration in a wide range.

Hollow Cathode Plasma (HCP) Enhanced Atomic Layer Deposition of Silicon Nitride (SiNx) Thin Films Using Pentachlorodisilane (PCDS)

2019 ◽  
Vol 89 (3) ◽  
pp. 63-69 ◽  
Author(s):  
Su Min Hwang ◽  
Aswin L. N. Kondusamy ◽  
Zhiyang Qin ◽  
Harrison Sejoon Kim ◽  
Xin Meng ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Hollow Cathode ◽  
Atomic Layer ◽  
Cathode Plasma ◽  
Layer Deposition
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