Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
2016 ◽
Vol 31
(7)
◽
pp. 075003
◽
2014 ◽
Vol 32
(3)
◽
pp. 031508
◽
Keyword(s):
2018 ◽
Vol 86
◽
pp. 111-114
◽
2020 ◽
Vol 38
(6)
◽
pp. 062407
Keyword(s):
Keyword(s):
Keyword(s):
2015 ◽
Vol 33
(1)
◽
pp. 01A143
◽
Keyword(s):
2015 ◽
Vol 12
(4-5)
◽
pp. 394-398
◽
Keyword(s):
2016 ◽
Vol 34
(1)
◽
pp. 01A125
◽
Keyword(s):