Hollow Cathode Plasma (HCP) Enhanced Atomic Layer Deposition of Silicon Nitride (SiNx) Thin Films Using Pentachlorodisilane (PCDS)

2019 ◽  
Vol 89 (3) ◽  
pp. 63-69 ◽  
Author(s):  
Su Min Hwang ◽  
Aswin L. N. Kondusamy ◽  
Zhiyang Qin ◽  
Harrison Sejoon Kim ◽  
Xin Meng ◽  
...  

2015 ◽  
Vol 3 (37) ◽  
pp. 9620-9630 ◽  
Author(s):  
Ali Haider ◽  
Seda Kizir ◽  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Shahid Ali Leghari ◽  
...  

Hollow cathode plasma assisted atomic layer deposited InxGa1−xN alloys show successful tunability of the optical band gap by changing the In concentration in a wide range.


2015 ◽  
Vol 12 (4-5) ◽  
pp. 394-398 ◽  
Author(s):  
Cagla Ozgit-Akgun ◽  
Eda Goldenberg ◽  
Sami Bolat ◽  
Burak Tekcan ◽  
Fatma Kayaci ◽  
...  

2018 ◽  
Vol 10 (16) ◽  
pp. 14116-14123 ◽  
Author(s):  
Xin Meng ◽  
Harrison Sejoon Kim ◽  
Antonio T. Lucero ◽  
Su Min Hwang ◽  
Joy S. Lee ◽  
...  

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