scholarly journals Atomic/molecular layer deposition of Ni-terephthalate thin films

2021 ◽  
Author(s):  
Anish Philip ◽  
Sami Vasala ◽  
Pieter Glatzel ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Organic Components ◽  
Layer Deposition ◽  
Metal Organic

Atomic/molecular layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential...

scholarly journals Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

2020 ◽  
Vol 49 (32) ◽  
pp. 11310-11316
Author(s):  
Aida Khayyami ◽  
Anish Philip ◽  
Jenna Multia ◽  
Maarit Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.

scholarly journals Inorganic–organic superlattice thin films for thermoelectrics

2015 ◽  
Vol 3 (40) ◽  
pp. 10349-10361 ◽  
Author(s):  
J.-P. Niemelä ◽  
A. J. Karttunen ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Conductivity ◽  
Thermoelectric Materials ◽  
Electrical Transport ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Electrical Transport Properties ◽  
Molecular Layer Deposition ◽  
Layer Deposition

Nanoscale layer-engineering using the combined atomic/molecular layer deposition (ALD/MLD) technique for the fabrication of oxide–organic thin-film superlattices is an attractive way to tailor the performance of thermoelectric materials as it potentially allows us to suppress thermal conductivity without significantly hindering the electrical transport properties.

scholarly journals ALD/MLD fabrication of luminescent Eu-organic hybrid thin films using different aromatic carboxylic acid components with N and O donors

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carboxylic Acid ◽  
Molecular Layer ◽  
Organic Thin Film ◽  
Aromatic Carboxylic Acid ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Hybrid Thin Films

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.

scholarly journals MOF thin films with bi-aromatic linkers grown by molecular layer deposition

2020 ◽  
Vol 8 (5) ◽  
pp. 2539-2548 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Malin Solheim Olsen ◽  
Per-Anders Hansen ◽  
Håkon Valen ◽  
Ola Nilsen
Keyword(s):  
Thin Films ◽  
Molecular Layer ◽  
Metal Organic Frameworks ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Wide Range ◽  
Metal Organic ◽  
Sensor Materials

Thin films of metal–organic frameworks (MOFs) are promising for a wide range of applications including membranes for separations and sensor materials in microelectronics.

Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

2020 ◽  
Vol 56 (62) ◽  
pp. 8778-8781
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgenii Modin ◽  
Mladen Petravić ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Ring Opening ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Ring Opening Reactions

Two consecutive vapor-to-solid ring opening reactions were applied for thin film siloxane polymerization by molecular layer deposition (MLD).

scholarly journals ALD/MLD processes for Mn and Co based hybrid thin films

2016 ◽  
Vol 45 (26) ◽  
pp. 10730-10735 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Terephthalic Acid ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Organic Hybrid ◽  
Layer Deposition ◽  
Benzenedicarboxylic Acid ◽  
Hybrid Thin Films ◽  
Metal Organic

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

scholarly journals Atomic/molecular layer deposition: a direct gas-phase route to crystalline metal–organic framework thin films

2016 ◽  
Vol 52 (6) ◽  
pp. 1139-1142 ◽  
Author(s):  
E. Ahvenniemi ◽  
M. Karppinen
Keyword(s):  
Thin Films ◽  
Gas Phase ◽  
Metal Organic Framework ◽  
Molecular Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Metal Organic ◽  
Substrate Surfaces ◽  
Crystalline Metal ◽  
Organic Framework

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal–organic framework (MOF) thin films on various substrate surfaces.

scholarly journals All-gas-phase synthesis of amino-functionalized UiO-66 thin films

2017 ◽  
Vol 46 (48) ◽  
pp. 16983-16992 ◽  
Author(s):  
Kristian Blindheim Lausund ◽  
Veljko Petrovic ◽  
Ola Nilsen
Keyword(s):  
Thin Films ◽  
Gas Phase ◽  
Molecular Layer ◽  
Metal Organic Frameworks ◽  
Molecular Layer Deposition ◽  
Phase Synthesis ◽  
Gas Phase Synthesis ◽  
Layer Deposition ◽  
Metal Organic

Thin films of metal–organic frameworks (MOFs) prepared using all-gas-phase techniques such as atomic/molecular layer deposition (ALD/MLD) are emerging due to their potential for enabling suitable applications.

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